STD Oxide-Adv. PECVD2 Table recipe.xlsx

	A	B	C	D	E	F	G	H	I	J	K	L	M
1		Advanced PECVD#2 STD Oxide
2	Process steps	Coat				Deposition				Chamber cleaning
3		Recipe: "STD SiO2" (chamber coat ~200A)				Recipe: "STD SiO2"				Recipe: "STD CF4/O2"
4		Initial	Pressure Stab	Process step	End step	Initial	Pressure Stab	Process step	End step	Initial	Pressure Stab	Process step	End step
5	Tiime (sec)	10	30	usually 10min	30	10	30	As required	30	10	30	As required	30
6	Pressure (mTorr)	50	800	800	50	50	800	800	50	49	600	600	50
7	Electrode T=300C	300				300				200
8	Chamber T=60C	60				60				60
9	RF (W)		0	30			0	30			0	300
10	LF (W)		0	0			0	0			0	0
11	CF4O2 (sccm)										800	800
12	SiH4 (sccm)		300	300			300	300
13	N2 (sccm)
14	N2O (sccm)		1420	1420			1420	1420
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16	Category: production
17	coat~10min (will coat~300nm)
18	deposition ~ as required
19	clean= coat+dep. time
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