6.24 CVD - Picosun ALD Al2O3 QM

	A	B	C	G
1
2	CVD - Picosun - Atomic Layer Deposition (ALD) - Al2O3
3
4	Process Specification			Process Performance
5	Tool Name:	Picosun
6	Description:	This monitor tracks the ALD thickness, dep rate/cycle, and the uniformity of the deposition.
7	Description:
8	Recipe:	Al2O3 (standard recipe)
9	Layer Material:	Al2O3
10	Cycles:	500 :NOTE: prior to 20190926 the #cycles was 400
11
12
13	Targeted Results:
14		Target	Description
15	Thickness [A]:	500 :NOTE: prior to 20190926 the #cycles was 400	5 point avg using Ellips
16	Thickness [A]:	500 :NOTE: prior to 20190926 the #cycles was 400	5 point avg using Ellips
17	Non-Uniformity [%]:	<5	Calculated using (MAX-MIN) / (MAX+MIN) method on thickness data.
18	Non-Uniformity [%]:	<5
19	Index of Refraction	1.5-1.6	measured using 5pt ellips average
20	Index of Refraction	1.5-1.6	measured using 5pt ellips average
21
22
23	Process Conditions:
24	ALD Deposition:
25	TMA +H20:		Open
26	Chamber Temp:		300C
27	Cycles:	500 :NOTE: prior to 20190926 the #cycles was 400
28
29
30	QM Process Procedure:
31	Step	Tool	Description
32	Stock Wafer	-	Bare Si P-type Test wafer
33	CVD	Picosun	Standard Al2O3 recipe
34	CVD	Picosun	Follow manual step by step everytime!
35	FT1	Ellips	5 point thickness
36
37
38	Ellipsometry Thickness/Index 25 pt maps
39	2019/03/19
40	2020/01/27
41
42
43	Ellipse 2 ALD comparison Picosun vs Cambridge
44	AL2O3 thickness		5/1/2018
45	TiO2 thickness		5/1/2018
46
47
48
49
50
51
52