6.24 CVD - Picosun ALD Al2O3 QM

	A	B	C	G
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2	CVD - Picosun - Atomic Layer Deposition (ALD) - Al2O3
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4	Process Specification			Process Performance
5	Tool Name:	Picosun
6	Description:	This monitor tracks the ALD thickness, dep rate/cycle, and the uniformity of the deposition.
7	Description:
8	Recipe:	Al2O3 (standard recipe)
9	Layer Material:	Al2O3
10	Cycles:	400
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13	Targeted Results:
14		Target	Description
15	Thickness [A]:	400	5 point avg using Ellips
16	Thickness [A]:	400	5 point avg using Ellips
17	Non-Uniformity [%]:	<5	Calculated using (MAX-MIN) / (MAX+MIN) method on thickness data.
18	Non-Uniformity [%]:	<5
19	Index of Refraction	1.5-1.6	measured using 5pt ellips average
20	Index of Refraction	1.5-1.6	measured using 5pt ellips average
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23	Process Conditions:
24	ALD Deposition:
25	TMA +H20:		Open
26	Chamber Temp:		300C
27	Cycles:		400
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30	QM Process Procedure:
31	Step	Tool	Description
32	Stock Wafer	-	Bare Si P-type Test wafer
33	CVD	Picosun	Standard Al2O3 recipe
34	CVD	Picosun	Follow manual step by step everytime!
35	FT1	Ellips	5 point thickness
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37	Ellipse 2 ALD comparison Picosun vs Cambridge
38	AL2O3 thickness		5/1/2018
39	TiO2 thickness		5/1/2018
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