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TimestampNameProjectTime StartCrystal (%)Substrate MaterialSource MaterialBoat Typefilm #Density (g/cm^3)Tooling FactorZ RatioRoughing: 1E1 min.Roughing: 1E0Roughing: 1E-1Cryopump: 1E-4Cryopump: 1E-5Pressure during deposition (micro torr)Evaporation Rate (A/s)Voltage (V)Current on gauge (A)Final Film Thickness (A)Cryopump: Max/Min Temp- erature (K)N2: Final Tank Pres (psi)Time FinishNotes
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4769/11David Allred2459:45 AM0glassLaF3ceramic coil56 .00.920.637673232273211.5/10200010 a.amBase pres was 5.7 e-7; used boat in righthand= thor power supply. ellipso thickne 343 nm
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4779/17David Allred2453:00 PM0glassAl coil12.7300.215051511.519001650ellipso thickness in centerr was 343nm
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4789/17David Allred245340 PM0glass LaF3ceramic coil560.920.637303-71805169911.51350BP=1 e 5- thickness in middle was 125nm by ellipso; BTW, the thickness monitro gave 1770 angs after air exposure.
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4799/18David Allred24550prvioueLaF4ceramic coil560.920.6371-8.1 to 3.71801.4190312/101250BP=1 e-6; evap starts at 135 V. rasie to 155 V rate =0.6 a/s. raise to 170 V; rate = 0.17nm/s; raise to 180 rate= 0.34 nm/s; rasie to 185 V rate= 0.37; reaches 190.7 nm as system cools.n upom venting goes to 229 nm after pump down goes back to 203 actual 161.3 nm in center
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4809/19David Allred24512.30glassAl coil12.70.5761.082.53.35.5/839 to 4 e-5300.215051511.512501650ellipso thickness in centerr was
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4819/19David Allred245340 PM0glass LaF3ceramic coil560.920.6379010 to 193-7180524711-12.511501500BP=evap started at 140V (slow) at 180V 0.16nm/s at 190 30.37nm/s;@200 0.5nm/s; e 5- thickness in middle was 125 nm by ellipso; BTW, the thickness monitro gave 249/25 nms beforeafter air exposure.
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2200 0.5nm/s
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