PECVD1 SiO2-300nm Thickness uniformity 2020

	A	B	C	D	E	F	G	H
1	20
2			Thickness, (Å)		Index @632.8nm			Comment
3
4			center of wafer	1cm from edge	center of wafer	1cm from edge
5		Date	Max	Min	Max	Min	Thickness Uniformity %
6		12-02-19	3201.70	3019.22	1.468	1.466	97.07	Film thicker in the center
7		01-09-20	3164.40	3036.80	1.462	1.461	97.94	Film thicker in the center
8		02-18-20	3173.42	2995.27	1.474	1.474	97.11	Film thicker in the center
9		05-27-20	3336.74	2948.63	1.469	1.468	93.83	Film thicker in the center
10		07-20-20	3301.33	3132.86	1.469	1.467	97.38	Film thicker in the center
11		08-26-20	3221.10	2900.20	1.469	1.467	94.76	Film thicker in the center
12		10-05-20	3156.45	2878.53	1.466	1.465	95.39	Film thicker in the center
13		10-14-20	2878.40	2715.30	1.459	1.465	97.08	Film thicker in the center
14		12-11-20	3313.35	3120.74	1.463	1.463	97.01	Film thicker in the center
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19		Average:	3194.10	2971.95	1.467	1.466	96.40
20		Avg +2%	3257.98	3031.39	1.496	1.496
21		Avg-2%	3130.22	2912.51	1.437	1.437
22
23		Max	3336.74	3132.86	1.474	1.474	97.94
24		Min	2878.40	2715.30	1.459	1.461	93.83
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