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File created for efficient co-editing of a manuscript in VPHA, Virtual Project on the History of ALD, http://vph-ald.com
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co-author:AkbashevBerdovaCameronCremersDeviElnikovaGottardiGrigorasJenKimKlibanovKuhsKääriäinenLapickiLeskeläLipsanenMalkovNorekOzgit-AkgunPedersenPiallatPopovPuurunenRauwelSalamiSchneiderSundqvistvan OmmenYlivaaraYurkevich
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No. Part in the manuscriptText
Comments by all co-authors
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AkbashevBerdovaCameronCremersDeviElnikovaGottardiGrigorasJenKimKlibanovKuhsKääriäinenLapickiLeskeläLipsanenMalkovNorekOzgit-AkgunPedersenPiallatPopovPuurunenRauwelSalamiSchneiderSundqvistvan OmmenYlivaaraYurkevich
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Abstract
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I Intro, 1
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Intro, 2
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Intro, 3
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Intro, 3
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II AMethods, A - ALD-history-evolving-file
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II BMethods, B - voting
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IIIResults - before table
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Results - table
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Some characteristics of molecular layering reactions, Aleskovskii, Kol'tsov, 1965, Ref X
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Interaction of titanium and germanium tetrachlorides with hydrated silica, Shevjakov, Kuznetsova, Aleskovskii, 1967, Ref X
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Preparation and investigation of the products of interaction between titanium tetrachloride and silica gel, Kol'tsov, 1969, Ref X
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Preparation and investigation of the chemical composition of the products formed by successive chemisorption of titanium and phosphorus chlorides on the surface of silica gel, Kol'tsov, Volkova, Aleskovskii, 1969, Ref X
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Measuring thicknesses of ultra-thin silicon oxide films deposited by molecular layering on the surface of single crystal silicon using polarization method, Sveshnikova, Kol'tsov, Aleskovskii, 1969, Ref X
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Formation of a silica layer of predetermined thickness on silicon by the molecular-layering method, Sveshnikova, Kol'tsov, Aleskovskii, 1970, Ref X
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Interaction of titanium tetrachloride with hydroxylated silicon surfaces, Sveshnikova, Kol'tsov, Aleskovskii, 1970, Ref X
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Synthesis of solids by the Molecular Layering Method, Kol’tsov, 1971, Ref X
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Chemistry and technology of solids, Aleskovskii, 1974, Ref X
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Chemical assembly of materials, Aleskovskii, 1975, Ref X
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Method and apparatus for the growth of compound thin films, Suntola, Antson, 1976, Ref X
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Synthesis and study of oxide coatings obtained by molecular layering on semiconductor surfaces, Drozd, 1978, Ref X
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Method and equipment for deposition of compound thin films. Suntola, Pakkala, Lindfors, 1980, Ref X
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Atomic layer epitaxy for producing EL thin films, Suntola, Antson, Pakkala, Lindfors, 1980, Ref X
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A study of ZnTe films grown on glass substrates using an atomic layer evaporation method, Ahonen, Pessa, Suntola, 1980, Ref X
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Atomic Layer Epitaxy , Suntola, 1981, Ref X
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Possibility of the use of a gravimetric method for studying the process of molecular layering in disperse silica samples, Tolmachev, 1982, Ref X
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Quantum chemical studies of the formation of zinc sulfide surface by the ALE technique, Pakkanen, Lindblad, Nevalainen, 1984, Ref X
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Atomic Layer Epitaxy, Suntola, Hyvärinen, 1985, Ref X
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Atomic layer epitaxy of III-V binary compounds, Bedair, Tischler, Katsuyama, El-Masry, 1985, Ref X
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Molecular Layer Epitaxy, Nishizawa, Abe, Kurabayashi, 1985, Ref X
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Atomic layer epitaxy, Goodman, Pessa, 1986, Ref X
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IVDiscussion, 1
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Discussion, 2
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Discussion, 3
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VSummary and Conclusions
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-Acknowledgements
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-Reference list
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