PECVD1 SiN-1000A Thickness uniformity 2017

	B	C	D	E	F	G	H
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2		Thickness, (Å)		Index @632.8nm
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4		center of wafer	1cm from edge	center of wafer	1cm from edge		4" Si Wafer
5	Date	Min	Max	Min	Max	Thickness Uniformity %
6	2-1-2017	1115.77	1084.13	2.079	2.083	98.56	Film thicker in the center
7	2-6-2017	1022.25	1011.37	1.914	1.915	99.46	Film thicker in the center
8	2-27-2017	1052.46	1062.30	1.927	1.928		Film thinner in the center
9	4-11-2017	1036.94	1022.41	1.881	1.879	99.29	Film thicker in the center
10	5-19-2017	1010.39	981.23	1.881	1.879	98.54	Film thicker in the center
11	6-16-2017	1037.58	1043.52	2.035	2.039		Film thinner in the center
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17	Average:	1045.898	1034.160	1.953	1.954	98.96
18	Avg. +2%	1066.816	1054.843	1.992	1.993
19	Avg. -2%	1045.480	1033.746	1.914	1.915
20	Max	1115.770	1084.130	2.079	2.083	99.46
21	Min	1010.390	981.230	1.881	1.879	98.54
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