6.10 Sputter Equipment Overview Table
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Marvell Nanolab Sputter Equipment
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Staff Target ChangesAdvanced Target ChangeQualified Member Target Change
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Toolmrc943mrc944aln2 - PM1aln2 - PM2aln2 - PM3sem-coateroxfordpvd1oxfordpvd2edwardsAST-SputterTool
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Manual Chapter6.156.126.126.126.196.176.186.76.13Manual Chapter
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Location584584584584584386586586582582Location
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Make/ModelMRC/943MRC/944Tegal/EndeavorATTegal/EndeavorATTegal/EndeavorATDenton Desk IIOxford/ Plasmalab 100Oxford/ Plasmalab 100Edwards/Auto306NanolabMake/Model
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Load LockYYYYYYY--Load Lock
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Gun Configuration4x DC Magnetron4x DC MagnetronDC Dual MagnetronRF Dual MagnetronDC Dual Magnetron1xDC Magnetron1x DC Magnetron1x DC Magnetron1 DC Magnetron 1 RF Magnetron3x Lesker Torus Mag KeeperGun Configuration
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Target size14-7/8"x4.75"14-7/8"x4.75"7" & 11" dual s-gun7" & 11" dual s-gun7" & 11" dual s-gun2.375" disc10" disc10" disc3" disc3" discTarget size
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TargetsNb, Ti, Al/MnAl/Mn, Al/Si, Ti, WMoAlAl (Ti available)Au/PdManual has inventoryManual has inventoryManual has up to date inventoryManual has up to date inventoryTargets
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Target ChangeStaffStaffStaffStaffStaffStaffStaffStaffMemberMemberTarget Change
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Control InterfaceGUIGUIGUIGUIGUIManualGUIGUImanualGUIControl Interface
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Base Pressure1E-7 Torr1E-7 Torr5E-8 Torr5E-8 Torr5E-8 Torr50mtorr2.00E-072.00E-071E-5 Torr2E-7 TorrBase Pressure
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Pumpdown Time (min)10105551055180120 - 600 (process variable)Pumpdown Time (min)
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Max DC power10kW10kW10kW-10kW60Watt5kW5kW300W1.5kWMax DC power
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Pulse Freq-5 kHz----5 - 350 kHz5 - 350 kHz-10-100kHzPulse Freq
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Max RF power---10kW----300W-Max RF power
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Frequency?---40kHz--13.56 MHz-Frequency?
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RF Sputter Etch300W300W300W300W300WNo, DC Sputter Etch, 18W300W300W-Capable but no P/SRF Sputter Etch
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HiVac Pumpcryocryoturbo & water pumpturbo & water pumpturbo & water pump-TurboTurboturboCryoHiVac Pump
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Temp Control--Heat lampsHeat lampsHeat lamps-Resistive platenResistive platen-Heated PlatenTemp Control
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Pressure ControlGas FlowGas FlowGas FlowGas FlowGas FlowGas FlowAPCAPCGas FlowGas Flow or Throttle ValvePressure Control
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Substrateup to 8" wafer (chips ok)up to 8" wafer (chips ok)6", 4" adapter6", 4" adapter6", 4" adapter2"6"6"4", 6"Up to 6"Substrate
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Wafer HandlerPallet up to 4x 6" waferPallet up to 4x 6" wafer13 wafers per cassette13 wafers per cassette13 wafers per cassetteSingleCassetteCassettesingle waferSingle waferWafer Handler
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Gas 1ArArArArArArArArArArGas 1
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Gas 2N2N2N2---N2 or O2N2 or O2N2Gas 2
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Gas 3---Upgrade Ready-----O2Gas 3
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Gas 4---------H2Gas 4
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Vacuum SpectroscopyRGA availableRGA availableRGA AvailableRGA AvailableRGA Available-Available with rolling cartAvailable with rolling cart-RGA availableEmission Spectroscopy
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