STD LS Nitride2-Adv. PECVD2 Table recipe.xlsx

	A	B	C	D	E	F	G	H	I	J	K	L	M	N	O
1		Advanced PECVD#2 STD LS Nitride2
2	Process steps	Coat					Deposition					Chamber cleaning
3		Recipe: "STD LS Nitride2"(chamber coat)					Recipe: "STD LS Nitride2"					Recipe: "STD CF4/O2"
4		Initial	Pressure Stab	HF Process step	LF Process step	End step	Initial	Pressure Stab	HF Process step	LF Process step	End step	Initial	Pressure Stab	Process step	End step
5				Loop HF/LF, t=usually 10min					Loop HF/LF, t=as required
6	Tiime (sec)	10	30	8	1.5	30	10	30	8	1.5	30	10	30	As required	30
7	Pressure (mTorr)	50	800	800	800	50	50	800	800	800	50	49	600	600	50
8	Electrode T=300C	300					300					200
9	Chamber T=60C	60					60					60
10	RF (W)		0	30	30			0	30	30			0	300
11	LF (W)		0	0	0			0	0	0			0	0
12	CF4O2 (sccm)												800	800
13	SiH4 (sccm)		520	520	520			520	520	520
14	NH3 (sccm)		18	18	18			18	18	18
15	N2 (sccm)		980	980	980			980	980	980
16	N2O (sccm)		0	0	0			0	0	0
17
18	Category: production
19	coat~10min (will coat~80nm)
20	deposition ~ as required
21	clean= (coat+dep.) time
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