VPHA-ALD-thesis-list

	B	C	D	E	F	G	H	I	J	K	L	M	N	O	Q	R	T	U	V	X	Y	Z	AA
1	Doctoral theses made worldwide on ALD						# theses incl. professor's theses	555
2	Created within the Virtual Project on the History of ALD						# theses, PhD	539												PhD-equivalents
3	* Sources for theses in Finland and Russia: FinALD40 exhibition and the ML essay
4	* For other theses, we have to search and ask																			19.1.2016	134
5	* Up to 1986, the list should to be complete. After that, let us try to make it as complete as possible, realizing that we will likely miss some works.																			3.2.2016	159	25
6	If you would like to have a thesis added, please add it in the file VPHA-thesis-to-be-added, link below:						# countries, PhD	30												4.2.2016	180	21
7	https://docs.google.com/spreadsheets/d/1hwMLL_LDDDT3VCBl3Z26KcO2FheOUEIXbGeIJOxD27Q/edit?usp=sharing															there is a better analysis in the analysis and plot sheets				19.2.2016	193	13
8																				25.2.2016	222	29
9	Year	Author name	Thesis name in English	Language of the thesis	Thesis name in original language (optional)	University	City	Country	# of pages (if known, without appendices)	# of pages, with appendices (if known)	Source of information	Link to pdf of thesis, if available	Other notes (optional)	To include in final list?	PhD thesis equivalents	539				29.2.2016	225	3
10															Countries	29				9.3.2016	266	41
11	1963	S. I. Koltsov	The study of interaction of carbon tetrachloride with silica gel	Russian	Исследование взаимодействия четыреххлористого углерода с кремнеземом	LTI by Lensovet	Leningrad	USSR		185	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Riikka: This does not yet mention the term "Molecular Layering" and does not report ALD cycles.							14.3.2016	266	0
12	1965	G.N. Kuznetsova	Study of a reaction products between hydrated silica and metal ions by IR spectroscopy	Russian	Исследование продуктов реакции между гидроокисью кремния и ионами металлов с помощью ИК-спектроскопии (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR			Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Belgium	12	Belgium	12		16.3.2016	273	7
13	1969	A. N. Volkova	Interaction of some chlorides with silica gel - reaction of molecular layering	Russian	Взаимодействие некоторых хлоридов с силикагелем реакции молекулярного наслаивания	LTI by Lensovet	Leningrad	USSR	171		Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: Mention "molecular layering". Or Kuznetsova was first?		Brazil	2	Brazil	2		30.3.2016	278	5
14	1971	G.V. Sveshnikova	Synthesis and study of thin oxide layers on the silicon surface	Russian	Синтез и исследование тонких оксидных слоев на поверхности кремния	LTI by Lensovet	Leningrad	USSR		184	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: modification of the silica surface instead of silicagel (as was common for the early works in USSR). Besides analytical chemistry techniques, ellipsometry and quartz surfaces were used		Canada	6	Canada	6		8.4.2016	295	17
15	1972	R. R. Rachkovskii	Synthesis and study of thin oxide layers on the surface of single-crystal silicon	Russian	Синтез и исследование тонких окисных слоев на поверхности монокристаллического кремния	LTI by Lensovet	Leningrad	USSR		133	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: besides the analytical chemistry techniques, ellipsometry and quartz surfaces were used		China	37	China	37		30.7.2016	297	2
16	1973	A. A. Malygin	Interaction of oxychlorides of vanadium, chromium and phosphorous with silica gel - reaction of molecular layering	Russian	Взаимодействие оксихлоридов ванадия, хрома и фосфора с силикагелем - реакции молекулярного наслаивания	LTI by Lensovet	Leningrad	USSR		163	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Estonia	8	Estonia	8		1.8.2016	312	15
17	1973	V. M. Smirnov	Synthesis and activity study of a thin oxide layers on the silica gel surface	Russian	Синтез и исследование химической активности тонких оксидных слоев на поверхности силикагеля (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		128	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: first mentioned the "monolayer effect"		Finland	109	Finland	109		19.8.2016	317	5	e.g., Nilsen, Ostreng, Sundberg
18	1974	E. P. Smirnov	Synthesis of carbon and titanium oxide layers on carbon surface by the molecular layering method	Russian	Синтез слоев оксидов углерода и титан на углеродной поверхности методом молекулярного наслаивания (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		184	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-241				France	43	France	43		12.9.2016	326	9
19	1974	T. V. Tuz	Synthesis and stability of thin oxide layers on the silica gel surface	Russian	Синтез и исследование устойчивости тонких оксидных слоев на поверхности кремнезема	LTI by Lensovet	Leningrad	USSR		113	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Germany	22	Germany	22		10.11.2017	347	21	After AVS64, many from Korea, also USA and Brazil
20	1977	M. A. Eremeeva	Synthesis and research by IR - ATR spectroscopy methods and ellipsometry of ultrathin oxide films on the surface of single crystal silicon and germanium	Russian	Синтез и исследование методами ИК - спектороскопии МНПВО и эллипсометрии сверхтонких окисных пленок на поверхности монокристаллов германия и кремния	LTI by Lensovet	Leningrad	USSR		184	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Iraq	1	Iraq	1		18.12.2018	372	23
21	1977	V. B. Kopylov	Synthesis of carbon layers on the silica gel surface by molecular layering and study of their properties	Russian	Синтез углеродных слоев на поверхности кремнезема методом молекулярного наслаивания и исследования их свойств	LTI by Lensovet	Leningrad	USSR		147	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Ireland	4	Ireland	4		14.01.2019	390	24	After Ritta's blog post
22	1977	V. I. Kovalkov	Synthesis of fine powder with desired structural and chemical properties of their surface using molecular layer deposition and the study of their properties	Russian	Синтез высокодисперсных твердых веществ с заданными структурно-химическими свойствами поверхности методом молекулярного наслаивания и исследование их свойств	LTI by Lensovet	Leningrad	USSR		181	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Italy	6	Italy	6		18.01.2019	394	24
23	1977	A. A. Malkov	Synthesis by molecular layering method of metal oxide layers on the surface of the carbon fibers and study of their properties	Russian	Синтез методом молекулярного наслаивания Э-О слоев на поверхности углеродных волокон и исследование их свойств	LTI by Lensovet	Leningrad	USSR		163	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Japan	7	Japan	7		22.01.2019	429	24
24	1978	V. E. Drozd	Synthesis and study of oxide coatings obtained by molecular layer deposition technique on the surface of semiconductors	Russian	Синтез и исследование оксидных покрытий, полученных методом молекулярного наслаивания на поверхности полупроводников	LTI by Lensovet	Leningrad	USSR		131	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: performed the vaccum reactor with in-situ ellipsometry and Peltier element (1975), before him atmospheric pressure reactors were used.		Norway	15	Norway	15	incl. USSR	29.01.2019	456	25
25	1978	A. M. Postnova	Study of the structure and reactivity of vanadium containing silica gel obtained by molecular layer deposition	Russian	Исследование строения и реакционной способности ванадийсодержащих кремнеземов, полученных методом молекулярного наслаивания	LTI by Lensovet	Leningrad	USSR		166	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Poland	5	Poland	5		12.07.2019	512	27
26	1978	N. A. Stepanova	Synthesis of iron and zinc-containing layers on the surface of silica gel	Russian	Синтез железо- и цинксодержащих слоев на поверхности кремнезема	LTI by Lensovet	Leningrad	USSR		176	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Russia	13	Russia incl. USSR	62		16.7.2019	518
27	1979	V. K. Gromov	Synthesis by the molecular layering method of titanium oxide layers on the surface of quartz, silicon, copper and ellipsometric study of substrate/ synthesized layer boundary	Russian	Синтез методом молекулярного наслаивания титан-кислородных слоев на поверхности кварца, кремния, меди и эллипсометрическое исследование границы сопряжения подложка - синтезированный слой	LTI by Lensovet	Leningrad	USSR		179	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				South Korea	32	South Korea	32
28	1979	V. N. Postnov	Synthesis of inorganic matrices using the molecular layering method and the study of their reactivity in the process of adsorption of amino acids	Russian	Синтез неорганических матриц методом молекулярного наслаивания и исследование их реакционной способности в процессе сорбции аминокислот	LTI by Lensovet	Leningrad	USSR		166	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Sweden	33	Sweden	33
29	1980	S. K. Gordeev	Synthesis of carbon, titanium, and chromium oxides on the diamond surface and study of their physicochemical properties	Russian	Синтез на поверхности алмаза углерода, оксидов титана и хрома и исследование их физико-химических свойств	LTI by Lensovet	Leningrad	USSR		210	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Switzerland	1	Switzerland	1
30	1980	V. D. Ivin	Synthesis of carbon and of phosphorus-carbon coatings on the carbon fiber surface and the study of their physico-chemical properties	Russian	Синтез углеродных и фосфоруглеродных покрытий на поверхности углеродного волокна и исследование их физико-химических свойств (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR			Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				The Netherlands	27	The Netherlands	27
31	1980	B. D. Sokolov	Effect of physical and chemical properties of carbon fiber surface on the reinforcement of composite materials	Russian	Влияние физико-химических свойств поверхности углеродных волокона упрочнение композиционных материалов	LTI by Lensovet	Leningrad	USSR		219	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Taiwan	0	Taiwan	0
32	1980	V. P. Tolstoy	Synthesis and physicochemical study of ultrathin oxide layers on metal surfaces	Russian	Синтез и физико-химическое исследование сверхтонких оксидных слоев на поверхности металлов	LTI by Lensovet	Leningrad	USSR		143	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				Turkey	1	Turkey	1
33	1980	M. N. Tsvetkova	Molecular layering of active structures on the surface of the glass microspheres and study of their physical and chemical properties	Russian	Молекулярное наслаивание активных структур на поверхности стеклянных микросфер и исследование их физико-химических свойств	LTI by Lensovet	Leningrad	USSR		196	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				UK	6	UK	6
34	1981	A. V. Krasnobryzhii	Reaction of titanium (IV) and iron (III) chlorides, vanadium (V) and chromium (VI) oxychlorides with various graphite materials	Russian	Взаимодействие хлоридов титана (IV) и железа (Ш), оксихлоридов ванадия (V) и хрома (VI) с углеграфитовыми материалами	LTI by Lensovet	Leningrad	USSR		183	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				USA	73	USA	73
35	1982	V. F. Dergachev	Development of technology for gas phase silica gel modification by vanadium	Russian	Разработка технологии парогазового процесса модифицирования силикагеля ванадием	LTI by Lensovet	Leningrad	USSR		148	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: developed automated multi-sectional ML apparatusfor powder coating using a fluidized bed mode		USSR	49
36	1982	N. N. Kopylov	Structure and properties of ultrathin titanium oxide layers synthesized on the monocrystalline silicon surface in an electric field	Russian	Структура и свойства сверхтонких титаноксидных слоев, синтезированных на поверхности монокристаллического кремния в электрическом поле	LTI by Lensovet	Leningrad	USSR		122	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240				24	512
37	1983	A. V. Brykalov	Synthesis of silica gel based hemosorbents by molecular layering method and their physico-chemical properties	Russian	Синтез гемосорбентов на основе кремнезема методом молекулярного наслаивания и их физико-химические свойства	LTI by Lensovet	Leningrad	USSR		153	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
38	1983	A. L. Egorov	Synthesis of thin oxide films on the surface of tantalum and gallium arsenide, their structure and properties	Russian	Синтез оксидных пленок на поверхности тантала и арсенида галлия, их структура и свойства	LTI by Lensovet	Leningrad	USSR		201	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
39	1983	Veli-Pekka Tanninen	X-ray diffraction studies of aluminium powder and electroluminescent zinc sulphide thin films	English		Helsinki University of Technology, Department of Technical Physics, Laboratory of Physics	Espoo	Finland	33		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
40	1983	Runar Törnqvist	Electroluminescence in ZnS:Mn thin film structures grown by atomic layer epitaxy	English		Helsinki University of Technology, Department of Technical Physics, Laboratory of Physics	Espoo	Finland	34		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
41	1984	Yu. M. Artemyev	Physico-chemical properties of iron polysilicates synthesized by chemical assembly	Russian	Физико-химические свойства полисиликатов железа, синтезированных методом химической сборки	LSU	Leningrad	USSR		161	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		In the CVD 2015 essay, year is given as 1989. At the internet this dissertation bearing a date 1984. Confirmed with Malygin --> 1984 is correct
42	1984	S. E. Kurashvili	The reaction of ammonia with a copper-titanium and copper-vanadium films synthesized on the surface of copper	Russian	Взаимодействие аммиака с медно-титан- и медно-ванадийхлоридными пленками, синтезированными на поверхности меди	LTI by Lensovet	Leningrad	USSR		186	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: Chemical assemble method. ALD cycle not mentioned (at least at the introduction). Thickness of the coatings were 100-500 nm.
43	1985	A. V. Evdokimov	Synthesis of multicomponent metal oxide monolayers on the silica gel surface and characteristics of their structure and inter-functional interactions	Russian	Синтез многокомпонентных элементоксидных монослоев на поверхности кремнезема, особенности их строения и межфункциональных взаимодействий	LTI by Lensovet	Leningrad	USSR		193	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
44	1985	A. A. Seitmagzimov	Chemical modification and the surface properties of the anode aluminum and titanium oxides	Russian	Химическое модифицирование и поверхностные свойства анодных оксидов алюминия и титана	LTI by Lensovet	Leningrad	USSR			Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
45	1985	T. A. Vitkovskaia	Surface modification of photoluminophors by the molecular layering technique	Russian	Модифицирование поверхности фотолюминофоров методом молекулярного наслаивания	LTI by Lensovet	Leningrad	USSR		158	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
46	1986	T. B. L'vova	Chemical modification of coal from the gaseous phase by vanadium (V), chromium (VI), and phosphorus (III) compounds and study of their absorptive properties	Russian	Химическое модифицирование углей из газовой фазы соединениями ванадия (V), хрома (VI), фосфора (III) и исследование свойств полученных адсорбентов	LTI by Lensovet	Leningrad	USSR		186	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
47	1986	A. B. Zhidkov	Gas phase kinetics of heterogeneous synthesis of titanium carbide and nitride on the surface of carbon materials	Russian	Кинетика гетерегенного синтеза карбида и нитрида титана из газовой фазы на поверхности углеродных материралов	LTI by Lensovet	Leningrad	USSR		202	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
48	1987	V.I. Gubaidullin	Synthesis and investigation of multilayer regular structures based on A2B6 compounds	Russian	Синтез и исследование многослойных регулярных структур на основе соединений A2B6	LTI by Lensovet	Leningrad	USSR
49	1987	A. N. Kriulkin	Physico-chemical properties of multilayer titanium-vanadium oxide films synthesized by molecular layering method on the surface of silicon	Russian	Физико-химические свойства мультислоев оксидных пленок титана и ванадия синтезированных методом молекулярного наслаивания на поверхности кремния (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
50	1987	A. I. Kudryashova	Acid-base properties of silicon, aluminum, zinc, and magnesium oxide surfaces and their changes in the process of structural and chemical transformations	Russian	Кислотно-основные свойства поверхности оксидов кремния, алюминия, цинка, магния и их изменения в процессах структурно-химических превращений	LTI by Lensovet	Leningrad	USSR		221	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
51	1987	Jukka Lahtinen	Electro-optical studies of semiconductor compounds for electroluminescent and laser devices	English		Helsinki University of Technology, Department of Technical Physics, Laboratory of Physics	Espoo	Finland	51		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
52	1987	V. A. Mitnikov	Synthesis, formation and some properties of zinc chalcogenide films produced by atomic layering	Russian	Синтез, формирование и некоторые свойства пленок халькогенидов цинка осажденных методом атомного наслаивания (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		Oksana: Atomic Layering method
53	1987	A.I. Romanychev	Precision synthesis of thin films of zinc and cadmium sulphides and multilayer periodic structures on their basis	Russian	Прецизионный синтез тонких пленок сульфидов цинка и кадмия и получение на их основе многослойных периодических структур	LSU	Leningrad	USSR
54	1987	S. A. Trifonov	Synthesis and thermal-oxidative stability of reaction products of phosphorus trichloride and phenolformaldehyde epoxy materials	Russian	Синтез и термоокислительная устойчивость продуктов взаимодействия треххлористого фосфора с поверхностью фенолоформальдегидных и эпоксифенольных материалов	LTI by Lensovet	Leningrad	USSR		152	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
55	1987	A. S. Yakovlev	Properties of interface boundaries between monocrystalline silicon and ultra-thin layers of titanium and silicon oxides synthesized by molecular layering method	Russian	Свойства поверхностных связей между монокристаллическим кремнием и ультратонкими слоями оксидов титана и кремния синтезированных методом молекулярного наслаивания (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
56	1988	S. V. Murashov	Synthesis and formation of cadmium chalcogenide films by surface chemical assembly	Russian	Синтез и формирование пленок халькогенидов кадмия методом химической сборки, атомным наслаиванием компонентов	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240		The novelty of the results was proved by obtaining of author's certificate #1443492 for "method of the production thin films with compounds A2B6" co-authorod by Aleskovskii and Ezhovskii
57	1988	Markku Oikkonen	X-ray diffraction and ellipsometric studies of zinc sulfide thin films grown by atomic layer epitaxy	English		Helsinki University of Technology, Department of Technical Physics, Laboratory of Physics	Espoo	Finland	46		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
58	1988	E. Yu. Popova	Gas phase modification of the dispersed silicon dioxide material by Zn, Fe, Ti containing structures and the use of these synthetic products in polymer composites	Russian	Газофазная модификация материала дисперсного диоксида кремния структурами, содержащими Zn, Fe, Ti, и использования этих синтетических продуктов в полимерных композитах. (Translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
59	1988	Markku Tammenmaa	The atomic layer epitaxy growth and characterization of zinc sulfide and alkaline earth sulfide thin films for electroluminescent applications	English		Helsinki University of Technology, Laboratory of Inorganic and Analytical Chemistry	Espoo	Finland	13		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
60	1989	E. A. Avrutina	Physico-chemical properties of the optically active titanium oxide structures synthesized by the molecular layering method on the surface of highly dispersed silica and zinc	Russian	Физико-химические свойства оптически активных титанокоидных оболочек, синтезированных методом молекулярного наслаивания на поверхности высокодисперсных оксидов кремния и цинка	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
61	1989	V. D. Kupriyanov	Synthesis on the dispersed silicon dioxide surface and modification of the luminescent zinc sulfide type structures	Russian	Синтез на поверхности дисперсного диоксида кремния и модифицирование люминисцентных структур цинксульфидного типа	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
62	1990	A. I. Klusevich	The synthesis and properties of thin film structures based on aluminum and tantalum oxides	Russian	Синтез и свойства тонкопленочных структур, созданых на базе оксидов алюминия и тантала (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
63	1990	P. V. Rogowskii	Physico-chemical properties and reactivity of multilayer vanadium, phosphorus and titanium oxide systems obtained by the molecular layering method	Russian	Физико-химические свойства и реактивность мультислоев оксидных систем ванадия, фосфора и титана полученных методом молекулярного наслаивания (translated by Oksana Yurkevich)	LTI by Lensovet	Leningrad	USSR		?	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
64	1991	Structural-chemical transformations on the surface of silicon dioxide by molecular layering, titanium- and silicon-nitrogen structures in the temperature range 200-800°C	Structural-chemical transformations on the surface of silicon dioxide by molecular layering, titanium - and silicon-nitrogen structures in the temperature range 200–800°C	Russian	Структурно-химические превращения на поверхности диоксида кремния в процессе молекулярного наслаивания титаноксидных, титан- и кремнийазотных структур в интервале температур 200-800°С	LTI by Lensovet	Leningrad	USSR		208	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
65	1992	Pipsa Helena Hirva	Theoretical studies on adsorption interactions on inorganic surfaces: Applications to semiconductors and inorganic oxides	English		Joensuun Yliopisto	Joensuun	Finland	30		AngelYanguas-Gil	http://search.library.northwestern.edu/primo_library/libweb/action/openurl?genre=article&sid=ProQ:&atitle=Theoretical+studies+on+adsorption+interactions+on+inorganic+surfaces%3A+Applications+to+semiconductors+and+inorganic+oxides&title=Theoretical+studies+on+adsorption+interactions+on+inorganic+surfaces%3A+Applications+to+semiconductors+and+inorganic+oxides&issn=&date=1992-01-01&volume=&issue=&spage=&pid=Hirva%2C+Pipsa+Helena&vid=nwu_services_page&institution=01NWU&url_ctx_val=&url_ctx_fmt=null&isSerivcesPage=true
66	1992	Marina Lindblad	Cluster models for chemisorption on non-metallic surfaces	English		University of Joensuu, Department of Chemistry	Joensuu	Finland	25		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
67	1992	Hele Siimon	Atomic layer molecular beam epitaxy of A2B6 compounds described on the basis of kinetic equations model	English		University of Tartu	Tartu	Estonia		115	Väino Sammelselg	http://www.ester.ee/record=b4062993*est
68	1993	Markku Åberg	An electroluminescent display simulation system and its application for developing grey scale driving methods	English		VTT Electronics. Acta Polytechnica Scandinavica. Electrical Engineering Series 74.	Espoo	Finland	76		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
69	1993	Suvi Haukka	Characterization of surface species generated in atomic layer epitaxy on silica	English		University of Helsinki, Department of Chemistry, Analytical Chemistry Division	Helsinki	Finland	46		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
70	1994	Lars-Peter Lindfors	Hydrogenation of toluene on supported nickel - from catalyst preparation to reaction kinetics	English		Åbo Akademi, Department of Chemical Engineering	Turku	Finland	50		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
71	1994	Mikko Ritala	Atomic layer epitaxy growth of titanium, zirconium and hafnium dioxide thin films	English		University of Helsinki, Department of Chemistry, Laboratory of Inorganic Chemistry	Helsinki	Finland	48		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
72	1996	Markku Ylilammi	Preparation and analysis of thin film electroluminescent devices	English		VTT Electronics	Espoo	Finland	79		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf		need to re-check the location!
73	1997	S. D. Dubrovenskii	Synthesis of vanadium titanium oxide nanostructures on the surface of silica gel and pyrographite and simulation of the processes of their formation	Russian	Синтез ванадий(титан) оксидных наноструктур на поверхности силикагеля и пирографита и моделирование процессов их формирования	Saint-Petersburg State Technological Institute (SPbSTI)	Saint Petersburg	Russia		229	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
74	1997	Janne Jokinen	Time-of-flight spectrometry of recoiled atoms in the analysis of thin films	English		University of Helsinki, Department of Physics, Accelerator Laboratory	Helsinki	Finland	38		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
75	1997	Zh. N. Ishutina	Phase formation and properties of materials in the compositions on the basis of the system Al2O3-SiO2-TiO2	Russian	Фазообразование и свойства материалов в нанокомпозициях на основе системы Al2 O3-SiO2-TiO2	Saint-Petersburg State Technological Institute (SPbSTI)	Saint Petersburg	Russia	182		Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
76	1997	Arla Kytökivi	Growth of ZrO2 and CrOx on high surface area oxide supports by atomic layer epitaxy	English		Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry	Espoo	Finland	54		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
77	1998	I.O. Nikiforova	Formation and investigation of charge properties of MOS structures based on alumina	Russian	Формирование и исследование зарядовых свойств МДП структур на основе оксида алюминия	Saint-Petersburg State University	Saint Petersburg	Russia
78	1998	Yasutoshi Ohtake	Study of high efficiency Cu(InGa)Se2 thin-film solar cells with various buffer layers	English		Tokyo	Tokyo	Japan			from K. Shima to Riikka	https://ci.nii.ac.jp/naid/500000165338?l=en
79	1998	O. V. Osipenkova	Local physico-chemical transformations on the surface of silica in the processes of interaction with TiCl4, VOCl3, CrO2Cl2 and H2O	Russian	Локальные физико-химические превращения на поверхности кремнезёма в процессах взаимодействия с TiCl4, VOCl3, Cr02Cl2 и Н20	Saint-Petersburg State Technological Institute (SPbSTI)	Saint Petersburg	Russia		177	Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
80	1998	Baosheng Sang	Study of transparent conducting ZnO grown by atomic layer deposition and its applications to amorphous silicon solar cells	English		Tokyo Institute of Technology	Tokyo	Japan			from K. Shima to Riikka	https://ci.nii.ac.jp/naid/500000165346?l=en
81	1998	Per Tägtström	Vapor phase deposition of WO and WC	English		Uppsala University, Department of Chemistry	Uppsala	Sweden	46		Mats Boman	no full text
82	1998	Marja Tiitta	Studies on precursors and their application in the atomic layer epitaxy growth of thin films for electroluminescent devices	English		Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry	Helsinki	Finland	44		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
83	1999	Arja Hakuli	Preparation and characterization of supported CrOx catalysts for butane dehydrogenation	English		Helsinki University of Technology, Department of Chemical Technology, Laboratory of Industrial Chemistry	Espoo	Finland	48		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
84	1999	Kaupo Kukli	Atomic layer deposition of artificially structured dielectric materials	English		University of Tartu	Tartu	Estonia	68	160	Väino Sammelselg	http://dspace.ut.ee/handle/10062/43525
85	1999	Maria Kurhinen	Interactions of Mo(CO)6 and Co2(CO)8 with alumina and silica supports: IR spectroscopic, modelling and temperature programmed studies	English		University of Joensuu, Department of Chemstry	Joensuu	Finland	36		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
86	1999	Per Mårtensson	Atomic layer epitaxy of copper	English		Uppsala University, Department of Chemistry	Uppsala	Sweden	45		Mats Boman	no full text is avaliable
87	1999	Sari Myllyoja	Chromium hexacarbonyl supported on alumina and silica surfaces by gas phase adsorption; characterisation and activity in hydrodesulphurisation	English		University of Joensuu, Department of Chemstry	Joensuu	Finland	36		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
88	1999	Sari Suvanto	Co2(CO)8 adsorbed on SiO2 and MCM-41: Gas phase preparation and characterisation	English		University of Joensuu, Department of Chemstry	Joensuu	Finland	33		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
89	1999	Mika Suvanto	Hydrotreating catalysts based on tungsten hexacarbonyl: Controlled preparation, characterisation and activity in thiophene hydrodesulphurisation	English		University of Joensuu, Department of Chemstry	Joensuu	Finland	34		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
90	1999	Mikko Utriainen	Exploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applications	English		Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry	Espoo	Finland	80		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
91	2000	Koji Dairiki	Study of Amorphous Silicon Solar Cells with High Stabilized-Efficiency	English		Tokyo Institute of Technology	Tokyo	Japan			from K. Shima to Riikka	https://ci.nii.ac.jp/naid/500000197768?l=en
92	2000	Wei-Min Li	Characterization and modification of SrS based blue thin film electroluminescent phosphors	English		University of Helsinki, Department of Chemistry, Laboratory of Inorganic Chemistry	Helsinki	Finland	44		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf	http://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/li/characte.html	Oksana: Atomic Layer Epitaxy, but ALD also mentioned. No mention of ALD cycle
93	2000	Mikael Schuisky	CVD and ALD in the Bi-Ti-O system	English		Uppsala University, Department of Chemistry	Uppsala	Sweden	47		Mats Boman	http://www.diva-portal.org/smash/get/diva2:166046/FULLTEXT01.pdf
94	2000	El Bekkaye Yousfi	Study of Atomic Layer Epitaxy (ALE) of oxides (ZnO, Al2O3) and sulfides (ZnS, In2S3) thin films: In situ quartz crystal microgravimetry and application for Cu(In,Ga)Se2 solar cells	French	Etude de la croissance de couches minces d'oxydes (ZnO, Al2O3) et de sulfures (ZnS, In2S3) par la méthode de dépôt chimique en phase vapeur à flux alternés (ALE): Etude par microgravimétrie à quartz et application à la réalisation des cellules solaires à base de Cu(In,Ga)Se2	Université Pierre et Marie Curie	Paris	France	220	228	N. Schneider
95	2001	Katarina Forsgren	CVD and ALD of Group IV- and V-Oxides for Dielectric Applications.	English		Uppsala University, Department of Materials Chemistry.	Uppsala	Sweden	55		Thesis online	https://www.diva-portal.org/smash/get/diva2:160934/FULLTEXT01.pdf
96	2001	Marika Juppo	Atomic Layer Deposition of Metal and Transition Metal Nitride Thin Films and In Situ Mass Spectrometry Studies	English		University of Helsinki, Department of Chemistry, Laboratory of Inorganic Chemistry	Helsinki	Finland	65		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf	http://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/juppo/	Oksana: In this thesis terms ALD, ALD cycle, temperature window are used
97	2001	Jung-Wook Lim	A study on the kinetic model the thin film growth in ALD	English		Korea Advanced Institute of Science and Technology	Deajeon	Republic of Korea		91	Korea Advnaced Institute of Science and Technology (KAIST)	http://library.kaist.ac.kr/thesis01/2001/2001D000965336_S1Ver2.pdf
98	2001	Björn Mårlid	Theoretical modelling of thin film growth in the B-N system	English		Uppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry.	Uppsala	Sweden	64		Mats Boman	http://kutol.narod.ru/PUBL/films.pdf
99	2001	Minna Nieminen	Deposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxy	English		Helsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical Chemistry	Espoo	Finland	57		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf	http://lib.tkk.fi/Diss/2001/isbn9512259141/	Oksana: Author uses the original name ALE, but says "Other names have therefore been suggested, such as atomic layer deposition (ALD), atomic layer chemical vapor deposition (ALCVD), atomic layer growth (ALG), digital layer epitaxy (DLE) and molecular layer epitaxy (MLE).Since the late 1990s,the name atomic layer deposition (ALD) appears to have won over the others." (with the ref. of Ritala, M. and Leskelä, M, in Handbook of Thin Film Materials 2001).
100	2001	Jarkko Räty	Re2(CO)10 deposited on g-alumina: temperature programmed studies, modelling and activity in thiophene hydrodesulphurization	English		University of Joensuu, Department of Chemstry	Joensuu	Finland	34		FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf