VPHA-ALD-thesis-list
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Doctoral theses made worldwide on ALD
# theses incl. professor's theses
348
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Created within the Virtual Project on the History of ALD
# theses, PhD332
PhD-equivalents
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* Sources for theses in Finland and Russia: FinALD40 exhibition and the ML essay
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* For other theses, we have to search and ask
19.1.2016134
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* Up to 1986, the list should to be complete. After that, let us try to make it as complete as possible, realizing that we will likely miss some works.
3.2.201615925
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If you would like to have a thesis added, please add it in the file VPHA-thesis-to-be-added, link below:
# countries, PhD214.2.201618021
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https://docs.google.com/spreadsheets/d/1hwMLL_LDDDT3VCBl3Z26KcO2FheOUEIXbGeIJOxD27Q/edit?usp=sharing
19.2.201619313
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25.2.201622229
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YearAuthor nameThesis name in English
Language of the thesis
Thesis name in original language (optional)
UniversityCityCountry
# of pages (if known, without appendices)
# of pages, with appendices (if known)
Source of information
Link to pdf of thesis, if available
Other notes (optional)
PhD thesis equivalents
32929.2.20162253
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Countries219.3.201626641
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1963S. I. Kol’tsovThe study of interaction of carbon tetrachloride with silica gelRussianИсследование взаимодействия четыреххлористого углерода с кремнеземомLTI by LensovetLeningradUSSR185Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
Riikka: This does not yet mention the term "Molecular Layering" and does not report ALD cycles.
14.3.20162660
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1965G.N. KuznetsovaStudy of a reaction products between hydrated silica and metal ions by IR spectroscopyRussianИсследование продуктов реакции между гидроокисью кремния и ионами металлов с помощью ИК-спектроскопии (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSRMalygin et al., Chem. Vap. Deposition 21 (2015) 216-240Belgium4Belgium416.3.20162737
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1969A. N. VolkovaInteraction of some chlorides with silica gel - reaction of molecular layeringRussianВзаимодействие некоторых хлоридов с силикагелем реакции молекулярного наслаиванияLTI by LensovetLeningradUSSR171Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: Mention "molecular layering". Or Kuznetsova was first?Canada5Canada530.3.20162785
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1971G.V. SveshnikovaSynthesis and study of thin oxide layers on the silicon surfaceRussianСинтез и исследование тонких оксидных слоев на поверхности кремнияLTI by LensovetLeningradUSSR184Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: modification of the silica surface instead of silicagel (as was common for the early works in USSR). Besides analytical chemistry techniques, ellipsometry and quartz surfaces were usedChina0China08.4.201629517
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1972R. R. RachkovskiiSynthesis and study of thin oxide layers on the surface of single-crystal siliconRussianСинтез и исследование тонких окисных слоев на поверхности монокристаллического кремнияLTI by LensovetLeningradUSSR133Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: besides the analytical chemistry techniques, ellipsometry and quartz surfaces were usedEstonia7Estonia730.7.20162972
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1973A. A. MalyginInteraction of oxychlorides of vanadium, chromium and phosphorous with silica gel - reaction of molecular layeringRussianВзаимодействие оксихлоридов ванадия, хрома и фосфора с силикагелем - реакции молекулярного наслаиванияLTI by LensovetLeningradUSSR163Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Finland91Finland911.8.201631215
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1973V. M. SmirnovSynthesis and activity study of a thin oxide layers on the silica gel surfaceRussianСинтез и исследование химической активности тонких оксидных слоев на поверхности силикагеля (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR128Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: first mentioned the "monolayer effect"France21France2119.8.20163175
e.g., Nilsen, Ostreng, Sundberg
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1974E. P. SmirnovSynthesis of carbon and titanium oxide layers on carbon surface by the molecular layering methodRussianСинтез слоев оксидов углерода и титан на углеродной поверхности методом молекулярного наслаивания (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR184Malygin et al., Chem. Vap. Deposition 21 (2015) 216-241Germany6Germany612.9.20163269
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1974T. V. TuzSynthesis and stability of thin oxide layers on the silica gel surfaceRussianСинтез и исследование устойчивости тонких оксидных слоев на поверхности кремнеземаLTI by LensovetLeningradUSSR113Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Iraq1Iraq1
20
1977M. A. EremeevaSynthesis and research by IR - ATR spectroscopy methods and ellipsometry of ultrathin oxide films on the surface of single crystal silicon and germaniumRussianСинтез и исследование методами ИК - спектороскопии МНПВО и эллипсометрии сверхтонких окисных пленок на поверхности монокристаллов германия и кремнияLTI by LensovetLeningradUSSR184Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Ireland4Ireland4
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1977V. B. KopylovSynthesis of carbon layers on the silica gel surface by molecular layering and study of their propertiesRussianСинтез углеродных слоев на поверхности кремнезема методом молекулярного наслаивания и исследования их свойствLTI by LensovetLeningradUSSR147Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Italy1Italy1
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1977V. I. KovalkovSynthesis of fine powder with desired structural and chemical properties of their surface using molecular layer deposition and the study of their propertiesRussianСинтез высокодисперсных твердых веществ с заданными структурно-химическими свойствами поверхности методом молекулярного наслаивания и исследование их свойствLTI by LensovetLeningradUSSR181Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Japan0Japan0
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1977A. A. MalkovSynthesis by molecular layering method of metal oxide layers on the surface of the carbon fibers and study of their propertiesRussianСинтез методом молекулярного наслаивания Э-О слоев на поверхности углеродных волокон и исследование их свойствLTI by LensovetLeningradUSSR163Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Norway3Norway3
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1978V. E. DrozdSynthesis and study of oxide coatings obtained by molecular layer deposition technique on the surface of semiconductorsRussianСинтез и исследование оксидных покрытий, полученных методом молекулярного наслаивания на поверхности полупроводниковLTI by LensovetLeningradUSSR131Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: performed the vaccum reactor with in-situ ellipsometry and Peltier element (1975), before him atmospheric pressure reactors were used. Poland5Poland5incl. USSR
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1978A. M. PostnovaStudy of the structure and reactivity of vanadium containing silica gel obtained by molecular layer depositionRussianИсследование строения и реакционной способности ванадийсодержащих кремнеземов, полученных методом молекулярного наслаиванияLTI by LensovetLeningradUSSR166Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Russia10
Russia incl. USSR
59
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1978N. A. StepanovaSynthesis of iron and zinc-containing layers on the surface of silica gelRussianСинтез железо- и цинксодержащих слоев на поверхности кремнеземаLTI by LensovetLeningradUSSR176Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240South Korea21South Korea21
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1979V. K. GromovSynthesis by the molecular layering method of titanium oxide layers on the surface of quartz, silicon, copper and ellipsometric study of substrate/ synthesized layer boundaryRussianСинтез методом молекулярного наслаивания титан-кислородных слоев на поверхности кварца, кремния, меди и эллипсометрическое исследование границы сопряжения подложка - синтезированный слойLTI by LensovetLeningradUSSR179Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Sweden34Sweden34
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1979V. N. PostnovSynthesis of inorganic matrices using the molecular layering method and the study of their reactivity in the process of adsorption of amino acidsRussianСинтез неорганических матриц методом молекулярного наслаивания и исследование их реакционной способности в процессе сорбции аминокислотLTI by LensovetLeningradUSSR166Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
The Netherlands
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The Netherlands
16
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1980S. K. GordeevSynthesis of carbon, titanium, and chromium oxides on the diamond surface and study of their physicochemical propertiesRussianСинтез на поверхности алмаза углерода, оксидов титана и хрома и исследование их физико-химических свойствLTI by LensovetLeningradUSSR210Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Taiwan0Taiwan0
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1980V. D. IvinSynthesis of carbon and of phosphorus-carbon coatings on the carbon fiber surface and the study of their physico-chemical propertiesRussianСинтез углеродных и фосфоруглеродных покрытий на поверхности углеродного волокна и исследование их физико-химических свойств (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSRMalygin et al., Chem. Vap. Deposition 21 (2015) 216-240Turkey1Turkey1
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1980B. D. SokolovEffect of physical and chemical properties of carbon fiber surface on the reinforcement of composite materialsRussianВлияние физико-химических свойств поверхности углеродных волокона упрочнение композиционных материаловLTI by LensovetLeningradUSSR219Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240UK2UK2
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1980V. P. TolstoySynthesis and physicochemical study of ultrathin oxide layers on metal surfacesRussianСинтез и физико-химическое исследование сверхтонких оксидных слоев на поверхности металловLTI by LensovetLeningradUSSR143Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240USA49USA49
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1980M. N. TsvetkovaMolecular layering of active structures on the surface of the glass microspheres and study of their physical and chemical propertiesRussianМолекулярное наслаивание активных структур на поверхности стеклянных микросфер и исследование их физико-химических свойствLTI by LensovetLeningradUSSR196Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240USSR49330
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1981A. V. KrasnobryzhiiReaction of titanium (IV) and iron (III) chlorides, vanadium (V) and chromium (VI) oxychlorides with various graphite materialsRussianВзаимодействие хлоридов титана (IV) и железа (Ш), оксихлоридов ванадия (V) и хрома (VI) с углеграфитовыми материаламиLTI by LensovetLeningradUSSR183Malygin et al., Chem. Vap. Deposition 21 (2015) 216-24022330
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1982V. F. DergachevDevelopment of technology for gas phase silica gel modification by vanadiumRussianРазработка технологии парогазового процесса модифицирования силикагеля ванадиемLTI by LensovetLeningradUSSR148Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: developed automated multi-sectional ML apparatusfor powder coating using a fluidized bed mode
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1982N. N. KopylovStructure and properties of ultrathin titanium oxide layers synthesized on the monocrystalline silicon surface in an electric fieldRussianСтруктура и свойства сверхтонких титаноксидных слоев, синтезированных на поверхности монокристаллического кремния в электрическом полеLTI by LensovetLeningradUSSR122Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
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1983A. V. BrykalovSynthesis of silica gel based hemosorbents by molecular layering method and their physico-chemical propertiesRussianСинтез гемосорбентов на основе кремнезема методом молекулярного наслаивания и их физико-химические свойстваLTI by LensovetLeningradUSSR153Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
38
1983A. L. EgorovSynthesis of thin oxide films on the surface of tantalum and gallium arsenide, their structure and propertiesRussianСинтез оксидных пленок на поверхности тантала и арсенида галлия, их структура и свойстваLTI by LensovetLeningradUSSR201Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
39
1983Veli-Pekka TanninenX-ray diffraction studies of aluminium powder and electroluminescent zinc sulphide thin filmsEnglishHelsinki University of Technology, Department of Technical Physics, Laboratory of PhysicsEspooFinland33FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
40
1983Runar TörnqvistElectroluminescence in ZnS:Mn thin film structures grown by atomic layer epitaxyEnglishHelsinki University of Technology, Department of Technical Physics, Laboratory of PhysicsEspooFinland34FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
41
1984Yu. M. ArtemyevPhysico-chemical properties of iron polysilicates synthesized by chemical assemblyRussianФизико-химические свойства полисиликатов железа, синтезированных методом химической сборкиLSULeningradUSSR161Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240In the CVD 2015 essay, year is given as 1989. At the internet this dissertation bearing a date 1984. Confirmed with Malygin --> 1984 is correct
42
1984S. E. KurashviliThe reaction of ammonia with a copper-titanium and copper-vanadium films synthesized on the surface
of copper
RussianВзаимодействие аммиака с медно-титан- и медно-ванадийхлоридными пленками, синтезированными на поверхности медиLTI by LensovetLeningradUSSR186Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: Chemical assemble method. ALD cycle not mentioned (at least at the introduction). Thickness of the coatings were 100-500 nm.
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1985A. V. EvdokimovSynthesis of multicomponent metal oxide monolayers on the silica gel surface and characteristics of their structure and inter-functional interactionsRussianСинтез многокомпонентных элементоксидных монослоев на поверхности кремнезема, особенности их строения и межфункциональных взаимодействийLTI by LensovetLeningradUSSR193Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
44
1985A. A. SeitmagzimovChemical modification and the surface properties of the anode aluminum and titanium oxidesRussianХимическое модифицирование и поверхностные свойства анодных оксидов алюминия и титанаLTI by LensovetLeningradUSSRMalygin et al., Chem. Vap. Deposition 21 (2015) 216-240
45
1985T. A. VitkovskaiaSurface modification of photoluminophors by the molecular layering techniqueRussianМодифицирование поверхности фотолюминофоров методом молекулярного наслаиванияLTI by LensovetLeningradUSSR158Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
46
1986T. B. L'vovaChemical modification of coal from the gaseous phase by vanadium (V), chromium (VI), and phosphorus (III) compounds and study of their absorptive propertiesRussianХимическое модифицирование углей из газовой фазы соединениями ванадия (V), хрома (VI), фосфора (III) и исследование свойств полученных адсорбентовLTI by LensovetLeningradUSSR186Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
47
1986A. B. ZhidkovGas phase kinetics of heterogeneous synthesis of titanium carbide and nitride on the surface of carbon materialsRussianКинетика гетерегенного синтеза карбида и нитрида титана из газовой фазы на поверхности углеродных материраловLTI by LensovetLeningradUSSR202Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
48
1987V.I. GubaidullinSynthesis and investigation of multilayer regular structures based on A2B6 compoundsRussianСинтез и исследование многослойных регулярных структур на основе соединений A2B6LTI by LensovetLeningradUSSR
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1987A. N. KriulkinPhysico-chemical properties of multilayer titanium-vanadium oxide films synthesized by molecular layering method on the surface of siliconRussianФизико-химические свойства мультислоев оксидных пленок титана и ванадия синтезированных методом молекулярного наслаивания на поверхности кремния (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
50
1987A. I. KudryashovaAcid -base properties of silicon, aluminum, zinc, and magnesium oxide surfaces and their changes in the process of structural and chemical transformationsRussianКислотно-основные свойства поверхности оксидов кремния, алюминия, цинка, магния и их изменения в процессах структурно-химических превращенийLTI by LensovetLeningradUSSR221Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
51
1987Jukka LahtinenElectro-optical studies of semiconductor compounds for electroluminescent and laser devicesEnglishHelsinki University of Technology, Department of Technical Physics, Laboratory of PhysicsEspooFinland51FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
52
1987V. A. MitnikovSynthesis, formation and some properties of zinc chalcogenide films produced by atomic layeringRussianСинтез, формирование и некоторые свойства пленок халькогенидов цинка осажденных методом атомного наслаивания (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240Oksana: Atomic Layering method
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1987A.I. RomanychevPrecision synthesis of thin films of zinc and cadmium sulphides and multilayer periodic structures on their basisRussianПрецизионный синтез тонких пленок сульфидов цинка и кадмия и получение на их основе многослойных периодических структурLSULeningradUSSR
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1987S. A. TrifonovSynthesis and thermal-oxidative stability of reaction products of phosphorus trichloride and phenolformaldehyde epoxy materialsRussianСинтез и термоокислительная устойчивость продуктов взаимодействия треххлористого фосфора с поверхностью фенолоформальдегидных и эпоксифенольных материаловLTI by LensovetLeningradUSSR152Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
55
1987A. S. YakovlevProperties of interface boundaries between monocrystalline silicon and ultra-thin layers of titanium and silicon oxides synthesized by molecular layering methodRussianСвойства поверхностных связей между монокристаллическим кремнием и ультратонкими слоями оксидов титана и кремния синтезированных методом молекулярного наслаивания (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
56
1988S. V. MurashovSynthesis and formation of cadmium chalcogenide films by surface chemical assemblyRussianСинтез и формирование пленок халькогенидов кадмия методом химической сборки, атомным наслаиванием компонентовLTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240The novelty of the results was proved by obtaining of author's certificate #1443492 for "method of the production thin films with compounds A2B6" co-authorod by Aleskovskii and Ezhovskii
57
1988Markku OikkonenX-ray diffraction and ellipsometric studies of zinc sulfide thin films grown by atomic layer epitaxyEnglishHelsinki University of Technology, Department of Technical Physics, Laboratory of PhysicsEspooFinland46FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
58
1988E. Yu. PopovaGas phase modification of the dispersed silicon dioxide material by Zn, Fe, Ti containing structures and the use of these synthetic products in polymer compositesRussianГазофазная модификация материала дисперсного диоксида кремния структурами, содержащими Zn, Fe, Ti, и использования этих синтетических продуктов в полимерных композитах. (Translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
59
1988Markku TammenmaaThe atomic layer epitaxy growth and characterization of zinc sulfide and alkaline earth sulfide thin films for electroluminescent applications?Helsinki University of Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland13FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
60
1989E. A. AvrutinaPhysico-chemical properties of the optically active titanium oxide structures synthesized by the molecular layering method on the surface of highly dispersed silica and zincRussianФизико-химические свойства оптически активных титанокоидных оболочек, синтезированных методом молекулярного наслаивания на поверхности высокодисперсных оксидов кремния и цинкаLTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
61
1989V. D. KupriyanovSynthesis on the dispersed silicon dioxide surface and modification of the luminescent zinc sulfide type structuresRussianСинтез на поверхности дисперсного диоксида кремния и модифицирование люминисцентных структур цинксульфидного типаLTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
62
1990A. I. KlusevichThe synthesis and properties of thin film structures based on aluminum and tantalum oxidesRussianСинтез и свойства тонкопленочных структур, созданых на базе оксидов алюминия и тантала (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
63
1990P. V. RogowskiiPhysico-chemical properties and reactivity of multilayer vanadium, phosphorus and titanium oxide systems obtained by the molecular layering methodRussianФизико-химические свойства и реактивность мультислоев оксидных систем ванадия, фосфора и титана полученных методом молекулярного наслаивания (translated by Oksana Yurkevich)LTI by LensovetLeningradUSSR?Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
64
1991E. A. SosnovStructural-chemical transformations on the surface of silicon dioxide by molecular layering, titanium - and silicon-nitrogen structures in the temperature range 200–800°CRussianСтруктурно-химические превращения на поверхности диоксида кремния в процессе молекулярного наслаивания титаноксидных, титан- и кремнийазотных структур в интервале температур 200-800°СLTI by LensovetLeningradUSSR208Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
65
1992Pipsa Helena HirvaTheoretical studies on adsorption interactions on inorganic surfaces: Applications to semiconductors and inorganic oxidesEnglishJoensuun YliopistoJoensuunFinland30AngelYanguas-Gil
http://search.library.northwestern.edu/primo_library/libweb/action/openurl?genre=article&sid=ProQ:&atitle=Theoretical+studies+on+adsorption+interactions+on+inorganic+surfaces%3A+Applications+to+semiconductors+and+inorganic+oxides&title=Theoretical+studies+on+adsorption+interactions+on+inorganic+surfaces%3A+Applications+to+semiconductors+and+inorganic+oxides&issn=&date=1992-01-01&volume=&issue=&spage=&pid=Hirva%2C+Pipsa+Helena&vid=nwu_services_page&institution=01NWU&url_ctx_val=&url_ctx_fmt=null&isSerivcesPage=true
66
1992Marina LindbladCluster models for chemisorption on non-metallic surfacesEnglishUniversity of Joensuu, Department of ChemistryJoensuuFinland25FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
67
1992Hele SiimonAtomic layer molecular beam epitaxy of A²B⁶ compounds described on the basis of kinetic equations modelEnglishUniversity of TartuTartuEstonia115Väino Sammelselg
http://www.ester.ee/record=b4062993*est
68
1993Markku ÅbergAn electroluminescent display simulation system and its application for developing grey scale driving methods?VTT Electronics. Acta Polytechnica Scandinavica. Electrical Engineering Series 74.EspooFinland76FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
69
1993Suvi HaukkaCharacterization of surface species generated in atomic layer epitaxy on silicaEnglishUniversity of Helsinki, Department of Chemistry, Analytical Chemistry DivisionHelsinkiFinland46FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
70
1994Lars-Peter LindforsHydrogenation of toluene on supported nickel - from catalyst preparation to reaction kineticsEnglishÅbo Akademi, Department of Chemical EngineeringTurkuFinland?FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
71
1994Mikko RitalaAtomic layer epitaxy growth of titanium, zirconium and hafnium dioxide thin filmsEnglishUniversity of Helsinki, Department of Chemistry, Laboratory of Inorganic ChemistryHelsinkiFinland48FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
72
1996Markku YlilammiPreparation and analysis of thin film electroluminescent devices?VTT ElectronicsEspooFinland79FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdfneed to re-check the location!
73
1997S. D. DubrovenskiiSynthesis of vanadium titanium oxide nanostructures on the surface of silica gel and pyrographite and simulation of the processes of their formationRussianСинтез ванадий(титан) оксидных наноструктур на поверхности силикагеля и пирографита и моделирование процессов их формированияSaint-Petersburg State Technological Institute (SPbSTI)Saint PetersburgRussia229Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
74
1997Janne JokinenTime-of-flight spectrometry of recoiled atoms in the analysis of thin filmsEnglishUniversity of Helsinki, Department of Physics, Accelerator LaboratoryHelsinkiFinland38FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
75
1997Zh. N. IshutinaPhase formation and properties of materials in the compositions on the basis of the system Al2O3-SiO2-TiO2RussianФазообразование и свойства материалов в нанокомпозициях на основе системы Al2 O3-SiO2-TiO2Saint-Petersburg State Technological Institute (SPbSTI)Saint PetersburgRussia182Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
76
1997Arla KytökiviGrowth of ZrO2 and CrOx on high surface area oxide supports by atomic layer epitaxyEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland54FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
77
1998I.O. NikiforovaFormation and investigation of charge properties of MOS structures based on aluminaRussianФормирование и исследование зарядовых свойств МДП структур на основе оксида алюминияSaint-Petersburg State UniversitySaint PetersburgRussia
78
1998O. V. OsipenkovaLocal physico-chemical transformations on the surface of silica in the processes of interaction with TiCl4, VOCl3, CrO2Cl2 и Н2ОRussianЛокальные физико-химические превращения на поверхности кремнезёма в процессах взаимодействия с TiCl4, VOCl3, Cr02Cl2 и Н20Saint-Petersburg State Technological Institute (SPbSTI)Saint PetersburgRussia177Malygin et al., Chem. Vap. Deposition 21 (2015) 216-240
79
1998Per TägtströmVapor phase deposition of WO and WCEnglishUppsala University, Department of ChemistryUppsalaSweden46Mats Bomanno full text
80
1998Lasse-Pekka TiainenSelective hydrogenation of citral on nickel, rhodium and ruthenium catalystsEnglishAbo AkademiTurkuFinland195Angel Yanguas-Gil
81
1998Marja TiittaStudies on precursors and their application in the atomic layer epitaxy growth of thin films for electroluminescent devicesEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland44FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
82
1999Arja HakuliPreparation and characterization of supported CrOx catalysts for butane dehydrogenationEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Industrial ChemistryEspooFinland48FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
83
1999Kaupo KukliAtomic layer deposition of artifially structured dielectric materialsEnglishUniversity of TartuTartuEstonia68160Väino Sammelselg
http://dspace.ut.ee/handle/10062/43525
84
1999Maria KurhinenInteractions of Mo(CO)6 and Co2(CO)8 with alumina and silica supports: IR spectroscopic, modelling and temperature programmed studiesEnglishUniversity of Joensuu, Department of ChemstryJoensuuFinland36FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
85
1999Per MårtenssonAtomic layer epitaxy of copperEnglishUppsala University, Department of ChemistryUppsalaSweden45Mats Bomanno full text is avaliable
86
1999Sari MyllyojaChromium hexacarbonyl supported on alumina and silica surfaces by gas phase adsorption; characterisation and activity in hydrodesulphurisationEnglishUniversity of Joensuu, Department of ChemstryJoensuuFinland36FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
87
1999Sari SuvantoCo2(CO)8 adsorbed on SiO2 and MCM-41: Gas phase preparation and characterisationEnglishUniversity of Joensuu, Department of ChemstryJoensuuFinland33FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
88
1999Mika SuvantoHydrotreating catalysts based on tungsten hexacarbonyl: Controlled preparation, characterisation and activity in thiophene hydrodesulphurisationEnglishUniversity of Joensuu, Department of ChemstryJoensuuFinland34FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
89
1999Mikko UtriainenExploiting atomic layer epitaxy thin film deposition technique in solid-state chemical sensor applicationsEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland80FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
90
2000Wei-Min LiCharacterization and modification of SrS based blue thin film electroluminescent phosphorsEnglishUniversity of Helsinki, Department of Chemistry, Laboratory of Inorganic ChemistryHelsinkiFinland44FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdfhttp://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/li/characte.htmlOksana: Atomic Layer Epitaxy, but ALD also mentioned. No mention of ALD cycle
91
2000Mikael SchuiskyCVD and ALD in the Bi-Ti-O systemEnglishUppsala University, Department of ChemistryUppsalaSweden47Mats Bomanhttp://www.diva-portal.org/smash/get/diva2:166046/FULLTEXT01.pdf
92
2000El Bekkaye Yousfi
Study of Atomic Layer Epitaxy (ALE) of oxides (ZnO, Al2O3) and sulfides (ZnS, In2S3) thin films : In situ quartz crystal microgravimetry and application for Cu(In,Ga)Se2 solar cells
French
Etude de la croissance de couches minces d'oxydes (ZnO, Al2O3) et de sulfures (ZnS, In2S3) par la méthode de dépôt chimique en phase vapeur à flux alternés (ALE): Etude par microgravimétrie à quartz et application à la réalisation des cellules solaires à base de Cu(In,Ga)Se2
Université Pierre et Marie CurieParisFrance220228N. Schneider
93
2001Katarina ForsgrenCVD and ALD of Group IV- and V-Oxides for Dielectric Applications.EnglishUppsala University, Department of Materials Chemistry.UppsalaSweden55Thesis onlinehttps://www.diva-portal.org/smash/get/diva2:160934/FULLTEXT01.pdf
94
2001Marika JuppoAtomic Layer Deposition of Metal and Transition Metal Nitride Thin Films and In Situ Mass Spectrometry StudiesEnglishUniversity of Helsinki, Department of Chemistry, Laboratory of Inorganic ChemistryHelsinkiFinland65FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdfhttp://ethesis.helsinki.fi/julkaisut/mat/kemia/vk/juppo/Oksana: In this thesis terms ALD, ALD cycle, temperature window are used
95
2001Björn MårlidTheoretical modelling of thin film growth in the B-N systemEnglishUppsala University, Teknisk-naturvetenskapliga vetenskapsområdet, Chemistry, Department of Materials Chemistry.UppsalaSweden64Mats Bomanhttp://kutol.narod.ru/PUBL/films.pdf
96
2001Minna NieminenDeposition of binary and ternary oxide thin films of trivalent metals by atomic layer epitaxyEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland57FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdfhttp://lib.tkk.fi/Diss/2001/isbn9512259141/Oksana: Author uses the original name ALE, but says "Other names have therefore been suggested, such as atomic layer deposition (ALD), atomic layer chemical vapor deposition (ALCVD), atomic layer growth (ALG), digital layer epitaxy (DLE) and molecular layer epitaxy (MLE).Since the late 1990s,the name atomic layer deposition (ALD) appears to have won over the others." (with the ref. of Ritala, M. and Leskelä, M, in Handbook of Thin Film Materials 2001).
97
2001Jarkko RätyRe2(CO)10 deposited on g-alumina: temperature programmed studies, modelling and activity in thiophene hydrodesulphurizationEnglishUniversity of Joensuu, Department of ChemstryJoensuuFinland34FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
98
2002Matti PutkonenDevelopment of low-temperature deposition processes by atomic layer epitaxy for binary and ternary oxide thin filmsEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Inorganic and Analytical ChemistryEspooFinland69FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
http://lib.tkk.fi/Diss/2002/isbn9512257084/
99
2002Riikka PuurunenPreparation by atomic layer deposition and characterisation of catalyst supports surfaced with aluminium nitrideEnglishHelsinki University of Technology, Department of Chemical Technology, Laboratory of Industrial ChemistryEspooFinland78FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
http://lib.tkk.fi/Diss/2002/isbn9512261421/
100
2002Timo SajavaaraHeavy ion recoil spectroscopy of surface layersEnglishUniversity of Helsinki, Department of Physical Sciences, Accelerator LaboratoryHelsinkiFinland64FinALD40 exhibition material, http://www.aldcoe.fi/events/finald40.pdf
http://ethesis.helsinki.fi/julkaisut/mat/fysik/vk/sajavaara/
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