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4.12 - Exposure of MiR 900 (3.5μm and 5.0μm) on quintel
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Description:This monitor tracks MiR 90 photoresist performance on quintel for 3.5μm and 5.0μm resist thicknesses. This monitor includes: 1) 3.5μm i-line dose to clear, 2) 5.0μm i-line dose to clear Process Performance
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Tool:quintel
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Resist and Developer:MiR 900 photoresist and MF-26A developer
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Mask:"Elbows Monitor" (Clearfield)
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Up-stream:Starting wafer is bare Si
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If new silicon wafer: clean in MSINK6 Piranha (10 minutes), MSINK6 HF (1 min)
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If stripping old litho wafer: clean in MSINK1 1165 (10 minutes), MSINK8 Pirahnha (10 minutes), MSINK8 HF (1 min)
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Down-stream:Patterned wafer is inspected and then retired (stripped and rerun)
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Tool Specifications
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StepToolSettings - 1.0μm ProcessSettings - 2.0μm Process
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4.21.1 - Prime, Coat, Soft Bake(picotrack1/ svgcoat6)Flow: MiR900_3.5um_Bake90C60sFlow: MiR900_5.0um_Bake60s90C
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Prime: 60s HMDSPrime: 60s HMDS
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Coat: MiR 900 3.5um Coat: MiR 900 5.0um
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Soft Bake: 90C 60 secondsSoft Bake: 90C 60 seconds
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4.11.2 - Thickness Varification(msp300)Check the average photoresist thickness and uniformity with a 5-point measurement at 5 cm intervals.
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4.21.2 - Expose(quintel)Check lamp intensity with the G&R Labs Intensity Meter using a 5-point measurement at 5 cm intervals. More lamp intensity information is included in the quintel Lamp Intensity Process Specification. Compare meter reading to power supply reading and check the uniformity. Expose wafers in hard contact mode. Run one wafer per exposure time, 1-2 seconds apart.
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4.21.3 - Develop(picotrack2/ svgdev6)Flow: Prox110C60s_MF26A2x30s_XtraSpray
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Post-expose bake: 110C 60 seconds
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Develop: MF-26A 2x30 second puddles, extray long spray step
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Output Response
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ResponseDescriptionTargetUSLLSL
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3.5μm Dose (mJ/cm²)Characterize best exposure time for the 3.5μm samples and use that to calculate the required dose. Check the wafer for smallest resolved feature. The wafer with the smallest well-resolved features is chosen for the best exposure time. Exposure dose is calculated using the equation (ExposureTime)*(LampIntensity)=Dose.7511050
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5.0μm Dose (mJ/cm²)Characterize best exposure time for the 5.0μm samples and use that to calculate the required dose. Check the wafer for smallest resolved feature. The wafer with the smallest well-resolved features is chosen for the best exposure time. Exposure dose is calculated using the equation (ExposureTime)*(LampIntensity)=Dose.11515090
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