PECVD1 SiO2-300nm Thickness uniformity 2020

	B	C	D	E	F	G	H
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2		Thickness, (Å)		Index @632.8nm			Comment
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4		center of wafer	1cm from edge	center of wafer	1cm from edge
5	Date	Max	Min	Max	Min	Thickness Uniformity %
6	12-02-19	3201.70	3019.22	1.468	1.466	97.07	Film thicker in the center
7	01-09-20	3164.40	3036.80	1.462	1.461	97.94	Film thicker in the center
8	02-18-20	3173.42	2995.27	1.474	1.474	97.11	Film thicker in the center
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19	Average:	3179.84	3017.10	1.468	1.467	97.37
20	Avg +2%	3243.44	3077.44	1.497	1.496
21	Avg-2%	3116.24	2956.75	1.439	1.438
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23	Max	3201.70	3036.80	1.474	1.474	97.94
24	Min	3164.40	2995.27	1.462	1.461	97.07
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