Thickness uniformity-Adv. PECVD STD Oxide 2021

	B	C	D	E	F	G	H
1
2		Thickness, A		Index @632.8nm		Thickn. Uniformity, %
3		Min	Max	Min	Max		Comment/Brian Lingg
4	Date	center of wafer	1cm from edge	center of wafer	1cm from edge	Thickness Uniformity, %
5	12-02-19	3115.79	3084.27	1.475	1.475	99.49	Thicker in the center
6	11-03-20	3001.50	2948.40	1.475	1.477	99.11	Thicker in the center
7	01-04-21	2902.80	2893.99	1.476	1.476	99.85	Thicker in the center
8	02-23-21	2803.00	2771.12	1.476	1.476	99.43	Thicker in the center
9	04-19-21	2826.50	2810.70	1.478	1.478	99.72	Thicker in the center
10	05-19-21	2729.60	2738.19	1.475	1.475		Thinner in the center
11	06-15-21	2757.95	2738.49	1.474	1.474	99.65	Thicker in the center
12
13
14
15
16
17
18	Average:	2876.73	2855.02	1.476	1.476	99.54	Silane gets lower- film thinner in center
19	Avg.+2%	2934.27	2912.12	1.505	1.505
20	Avg.-2%	2819.20	2797.92	1.446	1.446
21	Max	3115.79	3084.27	1.478	1.478	99.85
22	Min	2729.60	2738.19	1.474	1.474	99.11
23
24
25
26
27
28
29
30
31
32
33
34
35
36
37
38
39
40
41
42
43
44
45
46
47
48
49
50
51
52
53
54
55
56
57
58