Instrument-Status.xlsx
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AcronymNameOperatorLabStatusComment
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RAITHE-beam writer RAITH150 TwoDóczy, RobertEBLMinor issue
Vibrations in the lab better than MIRA, limited resolution, long-term solution, we're working on it
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KEITHLEY-4200Keithley 4200-SCS Parameter AnalyzerDóczy, RobertElectricalOperational
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LPCVDLow pressure chemical vapor depositionMünz, FilipDry etching/CVDOperational
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MOCVDMetal organic chemical vapor deposition (MOCVD)Münz, FilipDry etching/CVDOperational
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MPS1504-probe station Cascade Microtech MPS 150Dóczy, RobertElectricalOperational
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SUMMITSemi-automated 4-probe system Cascade Microtech SUMMIT 12000Dóczy, RobertElectricalOperational
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WIRE-BONDERWire bonder TPT HB 16Dóczy, RobertElectricalOperational
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ALDAtomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200Eliáš, MarekDry etching/CVDOperational
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DRIEDeep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100Eliáš, MarekDry etching/CVDOperational
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PECVDPlasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100Eliáš, MarekDry etching/CVDNon-operationalTMP not functional. TMP send to France
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PECVD-NANOFAB
High temperature plasma enhanced chemical vapour deposition system on C-based materials Oxford Instruments Plasma Technology NanoFab
Eliáš, MarekDry etching/CVDOperational
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RIE-CHLORINERIE by Chlorine Chemistry Oxford Instruments Plasma Technology PlasmaPro 100Eliáš, MarekDry etching/CVDOperational
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RIE-FLUORINEReactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 80Eliáš, MarekDry etching/CVDOperational
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SCIAIon beam etching Scia Systems Coat 200Eliáš, MarekDry etching/CVDMinor issueonly conductive sample
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Experimental-PECVD
Experimental PECVD: ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe
Eliáš, MarekPECVDOperational
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DIENERResist stripper Diener electronic NANO Plasma cleanerEliáš, MarekPhotolithographyOperational
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TERSScanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar IIMünz, FilipOptical/MUNIOperational
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EVAPORATORElectron beam evaporator BESTEC Eliáš, MarekPVDNon-operationalproblem with HV generator. Expected operation unknown
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MAGNETRONMagnetron sputtering system BESTECEliáš, MarekPVDOperational
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XERIONRapid thermal annealing Xerion XREACT/1 250°CEliáš, MarekPVDNon-operational
Quartz chamber broken again. Transport to Germany. Expected operation January 2018.
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NANOINDENTORHysitron TI 950
Králová, Veronika
SPMOperational
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DWLUV Direct Write Laser system Heidelberg Instruments DWL 66-fsPálesch, ErikEBLOperational
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FUMEHOOD-DEVELOPMENT
Fume Hood for DevelopmentPálesch, ErikPhotolithographyOperational
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FUMEHOOD-STRIPPINGFume Hood for StrippingPálesch, ErikPhotolithographyOperational
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SUSS-MA8Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3Pálesch, ErikPhotolithographyOperational
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SUSS-RCD8Resist coating and development system SÜSS MicroTec RCD8Pálesch, ErikPhotolithographyOperational
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SUSS-WETBENCHLithographic wetbenchPálesch, ErikPhotolithographyOperational
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LAURELL-SPIN COATERPálesch, ErikPhotolithographyOperational
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DEKTAKMechanical profilometer Bruker Dektak XTŠulc, DaliborPhotolithographyOperational
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LASER-DICERLaser dicer Oxford Lasers A-SeriesŠulc, DaliborServiceOperational
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ICON-SPMScanning Probe Microscope Bruker Dimension IconŠulc, DaliborSPMOperational
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MIRAScanning Electron Microscope/E-beam writer TESCAN MIRA3Švarc, VojtěchEBLMinor issue
Vibrations in the lab, limited resolution, long-term solution, we're working on it
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NANOCALCSpectroscopic reflectometer Ocean Optics NanoCalc 2000Švarc, VojtěchPhotolithographyOperational
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ZEISS-A2Optical microscope Zeiss Axio Imager A2Švarc, VojtěchPhotolithographyOperational
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LEICACOAT-NANOHigh vacuum coating system for electron microscopy Leica Microsystems EM ACE 600Švarc, VojtěchEmptyLabOperational
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