Report

	A	B	C	D	E	F	G	H	I
1	Instrument	Equipment Status	Note						Last use of major equipment (Green = OK)
2	GT2 Nanoscribe 3D Printer	Yes	Mirror (M8) was reppaced by field site engineer.						08/11/2025
3	NDR4000 Etcher (Modes: RIE and Deep RIE)	Yes	12/2024: The coolant of the Schiller has been drained and refilled!						08/11/2025
4	Reactive Ion Etcher	Down	Turbo pump failed.
5	Denton EXPLORER E-beam evaporator	Yes	Absorber/ Recharge/ Regeneration: 02/2024 - Pressure: 1E-7 Torr after two hours. Temp rises to 26 Kevin \|\| Noise from Cryo	Reg. 03/15/2024: Done!	Reg. 07/01/2024: Done! T = 13K	Reg. 07/16/2024: T = 14K	Reg. 12/2024 - T = 16 Kelvin - Passed!	Cleaned the e-beam 02/18/2024	08/11/2025
6	Temescal BJD-1800 E-beam evaportor	Down	Absorber/ Recharge/ Regen.: 02/2024 - Pressure 1.2 E-6 Torr after two hours. Temp 30 K - MP failed and replaced 04/18/2025	Reg. 03/15/2024: Done!	Reg. 07/01/2024: Passed!	Reg. 07/16/2024: T = 30K	(cooling line leakage, fixed) - Reg. 02/18/2024: Done - 30K!	04/25/2025: 3rd reg. in progress! Sam replaced MP. Oil from the MP gets into the vacuum line. After cleaning the vaccuum line and pnuematic valves of fore and raugh lines, 30K after Reg! Keep MP ON 24/7. High Vac valve leaks. Power loss: 05/19/2025: Reg. in progress (Passed)	08/19/2025: Exhust failure caused the failure of MP. The Roughing line is contaminated with black oil. Cleaning the vaccuum line is in progress.
7	ZnO sputter	Yes							07/16/2024
8	Metal sputter	Yes							12/2024
9	Fiji Atomic Layer Deposition	Yes	The pump has been repaired. The system is being tested - 12/1/2023. Repaired 6/12/2025 by Sam.
10	Karl Suss MA6 Mask Aligner	Yes							04/18/2025
11	Karl Suss MJB3 Mask Aligner	Yes							05/01/2025
12	Karl Suss MJB4 Mask Aligner	Yes							04/30/2025
13	Raith E-beam lithography	Down
14	Solaris 150 Rapid Thermal Process (RTP)	Yes
15	Tregeo Plasma Cleaner	Yes							5/2025
16	RCA clean	Yes
17	Oxidation and diffusion furnaces	Yes
18	Varian/Cary UV/VIS Spectrophotometer	Yes	IR Detector Down!
19	Atomic force microscope	Yes
20	Hall effect measurement system	Yes
21	Probe Station(s)	Yes
22	Semiconductor analyzer(s)	Yes
23	Wire bonder	Yes
24	Four-probe resistance measuremnet	Yes
25	Surface profiler XP-100	Yes
26	F20 FILMETRICS Thin Film Analyzer	Yes
27	Glovebox	Yes	G1 regenerated - 02/10/2024	G1 regenerated - Replaced three glovess and Catalyst- 12/2024 - needed a second regeneration "Done- passed". 80 ml water!	04/01/2025:P Reg. 40 ml water!	05/22/2025:P Reg. 60 ml water!	06/2025: Reg. of G1 and G2. 80 ml of water! Oxy. H2O < 0.1 ppm.
28	Ocean optics UV-VIS spectrometer	Yes
29	Wafer dicing saw	Down	To relocate to Room 0142 - 12/8/2023
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