PECVD1 SiO2-300nm Thickness uniformity 2018

	B	C	D	E	F	G	H
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2		Thickness, (Å)		Index @632.8nm			Comment
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4		center of wafer	1cm from edge	center of wafer	1cm from edge
5	Date	Max	Min	Max	Min	Thickness Uniformity %
6	11-15-17	3,130.34	2,995.50	1.461	1.459	97.80	Film thicker in the center, not uniform
7	01-25-18	3,178.73	3,067.85	1.467	1.467	98.22	Film thicker in the center, not uniform
8	02-26-18	2,811.70	2,787.20	1.478	1.478	99.56	Film thicker in the center, not uniform
9	04-12-18	3,105.50	2,958.30	1.458	1.457	97.57	Film thicker in the center, not uniform
10	04-17-18	3,028.10	2,743.40	1.459	1.458	95.07	Film thicker in the center, not uniform
11	06-14-18	3,180.91	2,841.94	1.458	1.458	94.37	Film thicker in the center, not uniform
12	08-14-18	3,434.14	2,840.12	1.461	1.458	90.53	Film thicker in the center, not uniform
13	11-02-18	3,019.58	2,915.13	1.462	1.459	98.24	Film thicker in the center, not uniform
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15	Average:	3,111.13	2,893.68	1.463	1.462	96.42
16	Avg +2%	3,173.35	2,951.55	1.492	1.491
17	Avg-2%	3,048.90	2,835.81	1.434	1.433
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19	Max	3,434.14	3,067.85	1.478	1.478	99.56
20	Min	2,811.70	2,743.40	1.458	1.457	90.53
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