Thickness uniformity-Unaxis SiO2 LDR 250C- 2019

	B	C	D	E	F	G	H
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2		Thickness, A		Index @632.8nm		Thickn. Uniformity, %
3		Min	Max	Min	Max		Comment/Mike SIlva
4	Date	center of wafer	1cm from edge	center of wafer	1cm from edge	Thickness Uniformity, %
5	12-02-19	3030.00	2958.61	1.465	1.454	98.81	Thicker in the center
6	12-03-19	2994.88	2923.96	1.464	1.454	98.80	Thicker in the center
7	12-03-19	2994.88	2923.96	1.464	1.454	98.80	Thicker in the center
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18	Average:	3006.59	2935.51	1.464	1.454	98.80
19	Avg.+2%	3066.72	2994.22	1.494	1.483
20	Avg.-2%	2946.46	2876.80	1.435	1.425
21	Max	3030.00	2958.61	1.465	1.454	#REF!
22	Min	2994.88	2923.96	1.464	1.454	#REF!
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