Unaxis SiN 250C SiH4 flow 12.5sccm 300nm - Data 2020

	A	B	C	D	E	F	G	H	I	J	N	R	S	W	X	Y	Z	AA	AB	AC	AD
1	Date	Film	Recipe	Subs. T	Seasoning	Dep.time	Thickness (Woollam)	Thickness (FilmMapper)	JAW EC-400 (Woolam S.E.)		Dep.rate	BHF e.r.	Stress	LPD (gain4) paricle size (0.16-1.6)um		Haze, for Gain 4	LPD (gain2) particle size (2.8-28.0)um		Photos	Photos	Comment/Tony Bosch maintenance
2			(SiN film with SiH4=12.5 sccm)	°C	min	sec	(nm)	(nm)	Index @ 632.8nm	Index @ 1550nm	(nm/min)	(nm/min)	MPa	Before deposition	After deposition	%	Before deposition	After deposition	Surfscan	Opt.micr. DF	4"Si wafer placed in the center of platen

3			SiN						Index		Dep.rate		Stress								Maintenance
4	12/16/19	SiN	SiN 250C	250	5	480	328.78	352.16	2.000	1.971	41.10	6.33	-677.33	108	245	52	7	54	OK	good	looks good
5	01/21/20	SiN	SiN 250C	250	5	480	338.12	357.74	1.995	1.965	42.26	to do!	-681.49	119	214	52	29	48	OK	to inspect	looks good
6	02/18/20	SiN	SiN 250C	250	5	480	346.21	366.34	1.984	1.955	43.28	to do!	-638.61	19	118	26	11	88	OK	to inspect	looks good
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18						Avg Thickness	337.70					6.33
19							Avg Index		1.993	1.964	42.21	Avg Stress	-665.81
20							Index+1%		2.013	1.983	46.43	Avg+30%	-865.55
21							Index-1%		1.973	1.944	37.99	Avg-30%	-466.07
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