6.20 ALD Overview
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ATOMIC LAYER DEPOSITION (ALD)
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Thermal ALDThermal / Plasma Enhanced ALD
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Marvell Equipment Namepicosuncambridge
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Marvell Nanolab Manual Chapter6.246.25
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Marvell Nanolab Location586586
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Equipment ModelSunale R150Fiji F200
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Equipment VendorPicosunNanolab
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Software/ OSProprietory and undocumented Labview/Windows on a laptop
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Plasma Source noYes, ICP 300W
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Substrate HeatingYesYes
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Chamber Temperature Limits100-350°C
MAX - 500°C Chuck, 300°C Cone and Chamber, MIN -100°
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ALD ValvesALD valves info TBDMAC Series 34 direct solenoid valve
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Valve response timeTBD10ms min pulse time (MAC rated response time 5ms)
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Number of Precursors36
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Number of Heated Precursors15
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Precursor Temp limit200°C200°C
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Thickness Monitornono
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Pulse Counter nono
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PlatformFork transports the wafer into the chamberSubstrate holder is left in the chamber during dep
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Wafer Capability6" or smaller on a 6" carrier8" or smaller
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Height of sample limitTBD6.35mm MAX
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Load lockYesYes
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Substrate transfer
Manual (LL to Fork). Computer controlled elevator
Automatic
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Typical Process Pressure8-9hPa (6-7T)0.1-1Torr
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Typical Process Pressure8-9hPa (6-7T)0.1-1Torr
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Materials allowed ONLY after Staff review
Polymers and other low temp melting pt. Polymers and other low temp melting pt. substrates
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Power SupplyTBD4.5kW per reactor
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Vacuum GaugeMKS Barratron 722AEdwards APGX-H dual Pirani and convection gauge
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PumpEdwards IQDP80AM Dry Pump
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Gases
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ArNoYes: 2 lines :Carrier and Plasma 200/1000 sccm
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N2Yes (4MFCs)Yes for Plasma 200sccm
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O2NoYes for Plasma 200sccm
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H2NoYes for Plasma 200sccm
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Supported Processes
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AL2O3YesYes
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TiO2YesYes
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TiNNoYes
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Ru/RuO2NoYes
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SiO2NoYes (Plasma only)
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ZrO2NoYes
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HfO2NoYes
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