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ABCDEFGHIJKLMNOPQRSTUVWXYZAAABACADAEAFAG
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List of ALD reviews for the ALD History Review (#10 in the VPHA Publication Plan)
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* Info originally from the ALD History Blog http://aldhistory.blogspot.fi
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* to be updated with info from all sources
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* To add review articles/books etc, please edit the info in the VPHA-reviews-to-be-added file, link:
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https://docs.google.com/spreadsheets/d/1AAA3UsHumhqlwKm-r_9SM5v0znrA5-VIVjxRtPR5810/edit#gid=828659824
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(oldest first)
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Year
Date published
Type:
Review / essay / inbook (= book chapter) / book / lecture notes / ...
Authors (for same year, make it alphabetical order, on the basis of first author's last name)
TitleReference# of
pages
# of
references
Internet link
Other info (such as ISBN no.)
Source of dataTimes cited
(ISI WoS)
ISI WoS,
date checked
Notes
10
11
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1974ReviewAleskovskii, V. B.Chemistry and technology of solidsZh. Prikl. Khim. 47 (1974) 2145–2157. [J. Appl. Chem. USSR 47, 2207 (1974)].-http://aldhistory.blogspot.fi
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1975ReviewAleskovskii, V. B.Chemical assembly of materialsVestn. Akad. Nauk SSSR, 1975, 48-52. [In Russian]5
14
1985August 1985ReviewSuntola, T., Hyvärinen, J.Atomic layer epitaxyAnnu. Rev. Mater. Sci. 15 (1985) 177–1951922
http://www.annualreviews.org/doi/abs/10.1146/annurev.ms.15.080185.001141?journalCode=matsci.1
http://aldhistory.blogspot.fi
15
1986ReviewGoodman, C. H. L., Pessa, M. VAtomic layer epitaxyJ. Appl. Phys. 60 (1986) R65–R811767
http://scitation.aip.org/content/aip/journal/jap/60/3/10.1063/1.337344
http://aldhistory.blogspot.fi
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1988ReviewBedair, S. M., McDermott, B. T., Ide, Y., Karam, N. H., Hashemi, H., Tischler, M. A., Timmons, M., Tarn, J. C. L. and Elmasry, N.Recent progress in atomic layer epitaxy of III–V compoundsJ. Cryst. Growth 93 (1988) 182–189824
http://www.sciencedirect.com/science/article/pii/0022024888905258
http://aldhistory.blogspot.fi
17
1989November 1989ReviewDenBaars, S. P., Dapkus, P. D.Atomic layer epitaxy of compound semiconductors with metalorganic precursorsJ. Cryst. Growth 98 (1989) 195–2081432
http://www.sciencedirect.com/science/article/pii/0022024889901991
http://aldhistory.blogspot.fi2711.2.2016
18
1989April 1989ReviewSuntola, T.Atomic Layer EpitaxyMater. Sci. Reports 4 (1989) 261–31252164
http://www.sciencedirect.com/science/article/pii/S0920230789800064
http://aldhistory.blogspot.fi
19
1989ReviewSuntola, TAtomic layer epitaxyActa Polytech. Scand., Electr. Eng. Ser. 64 (1989) 242–27029http://aldhistory.blogspot.fi
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1990ReviewAleskovskii, V. B., Drozd, V. E.Principles of the precise synthesis of supermolecular objects: atomic layer epitaxy, molecular layering, chemical buildupActa Polytech. Scand., Chem. Technol. Ser. 195 (1990) 155–1617http://aldhistory.blogspot.fi
21
1990ReviewBedair, S. M.Atomic layer epitaxy of semiconductor thin-filmsActa Polytech. Scand., Chem. Technol. Ser. 195 (1990) 17–3721http://aldhistory.blogspot.fi
22
1990ReviewLeskelä, M.Atomic layer epitaxy in the growth of polycrystalline and amorphous filmsActa Polytech. Scand., Chem. Technol. Ser. 195 (1990) 67–8014http://aldhistory.blogspot.fi
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1990ReviewSitter. H., Faschinger. W.Atomic-layer epitaxy of II–VI compound semiconductorsAdv. Solid State Phys. (Festkorperprobleme) 30 (1990) 219–237.1937
http://link.springer.com/chapter/10.1007/BFb0108290
Print ISBN 978-3-528-08038-9
http://aldhistory.blogspot.fi
24
1990ReviewLeskelä, M. and Niinistö, L.Chemical aspects of the ALE processAtomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 1–3939
http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612
ISBN-13: 978-9401066617 ISBN-10: 9401066612http://aldhistory.blogspot.fi
25
1990ReviewPakkanen, T.Theoretical aspects of the ALE growth mechanismsAtomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 40–6223
http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612
ISBN-13: 978-9401066617 ISBN-10: 9401066612http://aldhistory.blogspot.fi
26
1990ReviewMason, N. J.Comparison of ALE with other techniquesAtomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 63–10947
http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612
ISBN-13: 978-9401066617 ISBN-10: 9401066612http://aldhistory.blogspot.fi
27
1990ReviewTischler, M. A., Bedair, S. M.Atomic layer epitaxy of III– V compoundsAtomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 110–154.45
http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612
ISBN-13: 978-9401066617 ISBN-10: 9401066612http://aldhistory.blogspot.fi
28
1990ReviewYao, T.Atomic layer epitaxy of II–VI compoundsAtomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 155–18026
http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612
ISBN-13: 978-9401066617 ISBN-10: 9401066612http://aldhistory.blogspot.fi
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1990ReviewWatanabe, H., Mizutani, T. and Usui, A.Fundamentals of epitaxial growth and atomic layer epitaxy, In Very High Speed Integrated Circuits: HeterostructureEd. T. Ikoma, Vol. 30 of Semiconductors and Semimetals, Academic Press, San Diego 1990, pp. 1–5252http://aldhistory.blogspot.fi
30
1990
Review in conference proceedings
J. AarikAtomic Layer Epitaxy
Proceedings on Electroluminescence XVIII. Tartu Ülikooli Toimetised 908 Preparation and investigation of thin solid films, Tartu, Estonia 1990, pp. 5-33.
103
http://dspace.ut.ee/handle/10062/32165
(Riikka added)
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199111 FebruaryReviewBrian W. Gregory, John L. StickneyElectrochemical atomic layer epitaxy (ECALE)J. Electroanal. Chem. 300 (1991) 543–561.19112
http://www.sciencedirect.com/science/article/pii/002207289185415L
http://aldhistory.blogspot.fi24311.2.2016
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1991ReviewMarian A. HermanAtomic layer epitaxy—12 years laterVacuum 42 (1991) 61–66659
http://www.sciencedirect.com/science/article/pii/0042207X9190079X
http://aldhistory.blogspot.fi1411.2.2016
33
1991AugustReviewUsui, A., Watanabe, H.Atomic layer epitaxy of III–V electronic materialsAnnu. Rev. Mater. Sci. 21 (1991) 185–2193578
http://www.annualreviews.org/doi/abs/10.1146/annurev.ms.21.080191.001153?journalCode=matsci.1
http://aldhistory.blogspot.fi2211.2.2016
34
1992AprilReviewOzeki, M.Atomic layer epitaxy of III–V compounds using metalorganic and hydride sourcesMater. Sci. Rep. 8 (1992) 97–14649122
http://www.sciencedirect.com/science/article/pii/092023079290008O
http://aldhistory.blogspot.fi3511.2.2016
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199228 July - 2 AugustReviewSuntola, T.Atomic layer epitaxyThin Solid Films 216 (1992) 84–89615
http://www.sciencedirect.com/science/article/pii/004060909290874B
http://aldhistory.blogspot.fi41211.2.2016
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1992OctoberReviewUsui, A.Atomic layer epitaxy of III–V compounds: chemistry and applicationsProc. IEEE 80 (1992) 1641–16531366
http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=168671&url=http%3A%2F%2Fieeexplore.ieee.org%2Fxpls%2Fabs_all.jsp%3Farnumber%3D168671
http://aldhistory.blogspot.fi2411.2.2016
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199325 MarchReviewNiinistö, L. and Leskelä, M.Atomic layer epitaxy: chemical opportunities and challengesThin Solid Films 225 (1993) 130– 135641
http://www.sciencedirect.com/science/article/pii/004060909390141B
http://aldhistory.blogspot.fi3311.2.2016
38
199325 MarchReviewSuntola, T.Cost-effective processing by atomic layer epitaxyThin Solid Films 225 (1993) 96–9834
http://www.sciencedirect.com/science/article/pii/004060909390134B
http://aldhistory.blogspot.fi1511.2.2016
39
1994SeptemberReviewBedair, S. M.Atomic layer epitaxy deposition processesJ. Vac. Sci. Technol., B 12 (1994) 179–185.738http://dx.doi.org/10.1116/1.587179http://aldhistory.blogspot.fi1211.2.2016
40
1994DecemberReviewBedair, S. M. and El-Masry, N. A.Recent advances in atomic layer epitaxy devicesAppl. Surf. Sci. 82/83 (1994) 7–13719
http://dx.doi.org/10.1016/0169-4332(94)90187-2
http://aldhistory.blogspot.fi811.2.2016
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19941 JanuaryReviewHeitzinger, J. M., White, J. M., Ekerdt, J. G.
Mechanisms of GaAs atomic layer epitaxy - a review of progress
Surf. Sci. 299 (1994) 892–9081773
http://dx.doi.org/10.1016/0039-6028(94)90705-6
http://aldhistory.blogspot.fi1811.2.2016
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19942 JanuaryReviewLakomaa, E.-L.Atomic layer epitaxy (ALE) on porous substratesAppl. Surf. Sci. 75 (1994) 185–196.1236
http://dx.doi.org/10.1016/0169-4332(94)90158-9
http://aldhistory.blogspot.fi8811.2.2016
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1994ReviewSuntola, T.Atomic layer epitaxyHandbook of Crystal Growth, Ed. D. T. J. Hurle, Vol. 3, Elsevier, Amsterdam 1994, pp. 601–66363http://aldhistory.blogspot.fi
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1995JuneReviewLeskelä, M. and Ritala, M.Atomic layer epitaxy in deposition of various oxide and nitride thin filmsJ. Phys. IV France 5 (1995) C5/937–C5/95115107
https://hal.inria.fr/file/index/docid/253780/filename/ajp-jp4199505C5111.pdf
http://aldhistory.blogspot.fi5311.2.2016Open acess?
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199515 OctoberReviewMarian A. HermanApproaches to understanding MBE growth phenomenaThin Solid Films 267 (1995) 1–141469
http://dx.doi.org/10.1016/0040-6090(95)06592-X
http://aldhistory.blogspot.fi411.2.2016
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1995ReviewSuntola, T.Atomic layer epitaxyHandbook of Thin Film Process Technology, Eds. D. A. Glocker and S. I. Shah, Vol. 1, IOP Publishing, Bristol, United Kingdom 1995, pp. B1.5:1–B1.5:17.17http://aldhistory.blogspot.fi
47
19961 AugustReviewGeorge, S. M., Ott, A. W. and Klaus, J. W.Surface chemistry for atomic layer growthJ. Phys. Chem. 100 (1996) 13121–13131.1169
http://dx.doi.org/10.1021/jp9536763
http://aldhistory.blogspot.fi50312.2.2016
48
1996ReviewMalygin, A. A.Molecular layering technology and some of its applicationsZh. Prikl. Khim. 69 (1996) 1585–1593. [Russ. J. Appl. Chem. 69, 1419 (1996)]9http://aldhistory.blogspot.fi
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199615 JanuaryReviewMalygin, A. A., Malkov, A. A. and Dubrovenskii, S. D.The chemical basis of surface modification technology of silica and alumina by molecular layering methodAdsorption on new and modi ed inorganic sorbents, Eds. A. Dabrowski and V. A. Tertykh, Vol. 99 of Stud. Surf. Sci. Catal., Elsevier, Amsterdam 1996, pp. 213–236.2482
https://books.google.ru/books?id=n11C3L-YdfgC&printsec=copyright&hl=ru&source=gbs_pub_info_r#v=onepage&q&f=false
ISBN 0080526020, 9780080526027http://aldhistory.blogspot.fi
50
1996OctoberReviewNiinistö, L., Ritala, M. and Leskelä, M.Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applicationsMater. Sci. Eng., B 41 (1996) 23–29761
http://dx.doi.org/10.1016/S0921-5107(96)01617-0
http://aldhistory.blogspot.fi13912.2.2016
51
19962 JulyReviewSuntola, T.Surface chemistry of materials deposition at atomic layer levelAppl. Surf. Sci. 100/101 (1996) 391–398844
http://dx.doi.org/10.1016/0169-4332(96)00306-6
http://aldhistory.blogspot.fi8012.2.2016
52
1997SeptemberReviewHaukka, S. and Suntola, T.Advanced materials processing by adsorption controlInterface Sci. 75 (1997) 119–1281023
http://dx.doi.org/10.1023/A:1008601024870
http://aldhistory.blogspot.fi4912.2.2016
53
1997MarchReviewMarian A. HermanPhysical principles of ultrahigh vacuum atomic layer epitaxyAppl. Surf. Sci. 112 (1997) 1–111141
http://dx.doi.org/10.1016/S0169-4332(96)00980-4
http://aldhistory.blogspot.fi1612.2.2016
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1997MarchReviewMikko Ritala
Advanced ALE processes of amorphous and polycrystalline films
Appl. Surf. Sci. 112 (1997) 223–230.843
http://dx.doi.org/10.1016/S0169-4332(96)01004-5
http://aldhistory.blogspot.fi9212.2.2016
55
19982 April onlineReviewMalygin, A. A.
Modification of a filler’s surface by the molecular layering method
Compos. Interfaces 5 (1998) 561–5699
http://dx.doi.org/10.1163/156855498X00072
http://aldhistory.blogspot.fi312.2.2016
56
1998AprilReviewNiinistö, L.Atomic layer epitaxyCurr. Opin. Solid State Mater. Sci. 3 (1998) 147–152662
http://dx.doi.org/10.1016/S1359-0286(98)80080-6
http://aldhistory.blogspot.fi6612.2.2016
57
1999Review
Haukka, S., Lakomaa, E.-L. and Suntola, T.
Adsorption controlled preparation of heterogeneous catalystsIn Adsorption and its Applications in Industry and Environmental Protection, Ed. A. Dabrowski, Vol. 120A of Stud. Surf. Sci. Catal., Elsevier, Amsterdam 1999, pp. 715–75036http://aldhistory.blogspot.fi5812.2.2016
58
1999SeptemberReviewLeskelä, M. and Ritala, M.ALD precursor chemistry: evolution and future challengesJ. Phys. IV France 9 (1999) Pr8/837–Pr8/85216112
http://dx.doi.org/10.1051/jp4:19998106
http://aldhistory.blogspot.fi2412.2.2016
59
1999JulyReviewNiinistö, L.From precursors to thin films—thermoanalytical techniques in the thin film technologyJ. Therm. Anal. Calorim. 56 (1999) 7–15935
http://dx.doi.org/10.1023/A:1010154818649
http://aldhistory.blogspot.fi1812.2.2016
60
1999MarchReviewRitala, M. and Leskelä, M.Atomic layer epitaxy—a valuable tool for nanotechnology?Nanotechnology 10 (1999) 19–24647
http://dx.doi.org/10.1088/0957-4484/10/1/005
http://aldhistory.blogspot.fi20812.2.2016
61
199918 JuneReviewStickney, J. L.Electrochemical atomic layer epitaxyElectroanal. Chem. 21 (1999) 75–209135
https://books.google.ru/books?id=UEDDFHXLaIUC&printsec=frontcover&hl=ru&source=gbs_ge_summary_r&cad=0#v=onepage&q&f=false
ISBN 0824746791, 9780824746797http://aldhistory.blogspot.fi7312.2.2016
62
2001DecemberReviewIkeda, K., Yanase, J., Sugahara, S. and Matsumura, M.Atomic-layer- epitaxy of SiJ. Korean Phys. Soc. 39 (2001) S447–S458.12
http://cat.inist.fr/?aModele=afficheN&cpsidt=13426559
http://aldhistory.blogspot.fi112.2.2016
63
200222 AprilReviewLeskelä, M. and Ritala, M.Atomic layer deposition (ALD): from precursors to thin film structuresThin Solid Films 409 (2002) 138–1469111
http://dx.doi.org/10.1016/S0040-6090(02)00117-7
http://aldhistory.blogspot.fi52812.2.2016
64
2002ReviewMalygin, A. A.Synthesis of multicomponent oxide lowdimensional systems on the surface of porous silicon dioxide using the molecular layering methodZh. Obshch. Khim. 72 (2002) 617–632. [Russ. J. Gen. Chem. 72, 575 (2002)].16http://aldhistory.blogspot.fi
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2002ReviewRitala, M. and Leskelä, M.Atomic layer depositionIn Handbook of Thin Film Materials, Ed. H. S. Nalwa, Vol. 1, Academic Press, San Diego 2002, pp. 103–15957http://aldhistory.blogspot.fi
66
2003FebruaryReviewde Almeida, R. M. C. and Baumvol, I. J. R.Reaction–diffusion in high-k dielectrics on SiSurf. Sci. Rep. 49 (2003) 1–114114150
http://dx.doi.org/10.1016/S0167-5729(02)00113-9
http://aldhistory.blogspot.fi9212.2.2016
67
20032 SeptemberReviewJohn E. CrowellChemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologiesJournal of Vacuum Science and Technology A, 21, 2003, S88932
http://dx.doi.org/10.1116/1.1600451
http://aldhistory.blogspot.fi4312.2.2016
68
200326 FebruaryReviewJones, A. C. and Chalker, P. R.Some recent developments in the chemical vapour deposition of electrochemical oxidesJ. Phys. D: Appl. Phys. 36 (2003) R80–R9516
http://iopscience.iop.org/article/10.1088/0022-3727/36/6/202/meta
http://aldhistory.blogspot.fi
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2003ReviewHand, A.Industry begins to embrace ALDSemicon. Int. 26 (2003) 46–516
http://cat.inist.fr/?aModele=afficheN&cpsidt=14767326
http://aldhistory.blogspot.fi
70
20033 NovemberReviewKim, H.Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processingJ. Vac. Sci. Technol., B 21 (2003) 2231–226131186
http://dx.doi.org/10.1116/1.1622676
http://aldhistory.blogspot.fi31712.2.2016
71
200315 February - 1MarchReviewLeskelä, M. and Ritala, M.
Rare-earth oxide thin films as gate oxides in MOSFET transistors
J. Solid State Chem. 171 (2003) 170–174549
http://dx.doi.org/10.1016/S0022-4596(02)00204-9
http://aldhistory.blogspot.fi7712.2.2016
72
2003
18 November
ReviewLeskelä, M. and Ritala, M.Atomic layer deposition chemistry: Recent developments and future challengesAngew. Chem., Int. Ed. 42 (2003) 5548–5554738
http://dx.doi.org/10.1002/anie.200301652
http://aldhistory.blogspot.fi44612.2.2016
73
2003MayReviewSeidel, T., Londergan, A., Winkler, J., Liu, X. and Ramanathan, S.Progress and opportunities in atomic layer depositionSolid State Technol. 46 (2003) 67–715http://aldhistory.blogspot.fi1212.2.2016
74
2004ReviewJones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. and Leskelä, M.Some recent developments in the MOCVD and ALD of high- dielectric oxidesJ. Mater. Chem. 14 (2004) 3101–31121295http://dx.doi.org/10.1039/B405525Jhttp://aldhistory.blogspot.fi6012.2.2016
75
20047 MayReviewNiinistö, L., Päiväsaari, J., Niinistö, J., Putkonen, M. and Nieminen, M.Advanced electronic and optoelectronic materials by atomic layer deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materialsPhys. Status Solidi A 201 (2004) 1443–14521071
http://dx.doi.org/10.1002/pssa.200406798
http://aldhistory.blogspot.fi23012.2.2016
76
2004ReviewRitala, M.Atomic layer deposition
In High- Gate Dielectrics Ed. M. Houssa, IOP Publishing, London 2004, pp. 17–64
48http://aldhistory.blogspot.fi
77
200514 JulyReviewPutkonen, M., Sajavaara, T., Niinistö, L. and Keinonen, J.Analysis of ALD-processed thin films by ion-beam techniques,Anal. Bioanal. Chem. 382 (2005) 1791–1799947
http://dx.doi.org/10.1007/s00216-005-3365-3
http://aldhistory.blogspot.fi4512.2.2016
78
2005DecemberReview
Markku Leskelä, Kaupo Kukli, Mikko Ritala
Rare-earth oxide thin films for gate dielectrics in microelectronics
Journal of Alloys and Compounds 418 (2006) 27–348111doi:10.1016/j.jallcom.2005.10.061
79
200527 AugustReviewPutkonen, M. and Niinistö, L.Organometallic precursors for atomic layer depositionTop. Organomet. Chem. 9 (2005) 125–14521164http://dx.doi.org/10.1007/b136145http://aldhistory.blogspot.fi
80
200518 FebruaryReviewPuurunen, R. L.Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides: a reviewChemical Vapor Deposition 11 (2005) 79-901277
http://dx.doi.org/10.1002/cvde.200400021
http://aldhistory.blogspot.fi4512.2.2016
81
200530 JuneReviewPuurunen, R. L.Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water processJ. Appl. Phys. 97 (2005) 121301521207
http://www.vtt.fi/inf/julkaisut/muut/2010/Puurunen.pdf
http://aldhistory.blogspot.fi9455.2.2016Open access
we need to add another column for primary internet link, and secondary open access copy link
82
200619 JanuaryReviewElers, K. E., Blomberg, T., Peussa, M., Aitchison, B., Haukka, S. and Marcus, S.Film uniformity in atomic layer depositionChem. Vap. Deposition 12 (2006) 13–241229
http://dx.doi.org/10.1002/cvde.200500024
http://aldhistory.blogspot.fi4612.2.2016
83
2006JanuaryReviewHyoungsun Kim and Paul C. McIntyreAtomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device ApplicationsJournal of the Korean Physical Society, 48, 2006, 5-1713
https://inis.iaea.org/search/search.aspx?orig_q=RN:42074611
http://aldhistory.blogspot.fi4012.2.2016
84
2006MarchReviewJones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Manning, T. D., Loo, Y. F., O’Kane, R., Gaskell, J. M. and Smith, L. M.Mocvd and ald of high-kappa dielectric oxides using alkoxide precursorsChem. Vap. Deposition 12 (2006) 83–9816111
http://dx.doi.org/10.1002/cvde.200500023
http://aldhistory.blogspot.fi355.2.2016
85
2006Review articleA. A. MalyginThe molecular layering nanotechnology: Basis and applicationJ. Ind. Eng. Chem. Vol 12, No. 1, (2006) 1-11.1145Riikka + article from Malygin
86
2006MarchReviewSchumacher, M., Baumann, P. K. and Seidel, T.AVD and ALD as two complementary technology solutions for next generation dielectric and conductive thin-film processingChem. Vap. Deposition 12 (2006) 99–1081032
http://dx.doi.org/10.1002/cvde.200500027
http://aldhistory.blogspot.fi405.2.2016
87
20072 OctoberReviewKnez, M., Nielsch, K. and Niinistö, L.Synthesis and surface engineering of complex nanostructures by atomic layer depositionAdv. Mater. 19 (2007) 3425–343814113
http://dx.doi.org/10.1002/adma.200700079
http://aldhistory.blogspot.fi3965.2.2016
88
2008ReviewSherman, A.Atomic Layer Deposition for Nanotechnology: an enabling process for nanotechnology fabricationIvoryton Press, Connecticut 2008http://aldhistory.blogspot.fi
89
200817 JuneReviewZaera, F.The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturingJ. Mater. Chem. 18 (2008) 3521–3526678
http://dx.doi.org/10.1039/B803832E
http://aldhistory.blogspot.fi515.2.2016
90
200929 Sep. 2008 onlineReviewClavel, G., Rauwel, E., Willinger, M.-G. and Pinna, N.Nonaqueous sol-gel routes applied to atomic layer deposition of oxidesJ. Mater. Chem. 19 (2009) 454–462983
http://dx.doi.org/10.1039/B806215C
http://aldhistory.blogspot.fi265.2.2016
91
2009July ReviewEobert M. Wallace, Paul C. McIntyre, Jiyoung Kim and Yoshio NishiAtomic Layer Deposition of Dielectrics on Ge and III-V Materials for Ultrahigh performance TransistorsMRS Bulletin, 34, 2009, 493-5031128
http://dx.doi.org/10.1557/mrs2009.137
http://aldhistory.blogspot.fi715.2.2016
92
2009FebruaryReviewKim, H., Lee, H.-B.-R. and Maeng, W. J.Applications of atomic layer deposition to nanofabrication and emerging nanodevicesThin Solid Films 517 (2009) 2563–258018233
http://dx.doi.org/10.1016/j.tsf.2008.09.007
http://aldhistory.blogspot.fi2308.2.2016
93
2009AprilReviewNiinistö, J., Kukli, K., Heikkilä, M., Ritala, M. and Leskelä, M.Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory ApplicationsAdv. Eng. Mat. 11 (2009) 223–2341286
http://dx.doi.org/10.1002/adem.200800316
http://aldhistory.blogspot.fi488.2.2016
94
2009ReviewRitala, M. and Niinistö, J.
Chemical vapour deposition, Chapter 4: Atomic layer deposition
Royal Society of Chemistry, Cambridge, UK 2009, pp. 158–20649
https://books.google.ru/books?hl=ru&lr=&id=42SnND7502UC&oi=fnd&pg=PA451&dq=Chemical+vapour+deposition+Royal+Society+of+Chemistry,+Cambridge,+UK+2009,+pp.+158%E2%80%93206&ots=LUsKWVLbXM&sig=8InfZtYrt4WO8OikEEnJ_aC-NBc&redir_esc=y#v=onepage&q&f=false
ISBN 0854044655, 9780854044658http://aldhistory.blogspot.fi
95
2009Apr 7
Topical review
Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., van de Sanden, M. C. M., Kessels, W. M. M.
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition
J. Phys. D: 42 (2009) 0730011983
http://dx.doi.org/10.1088/0022-3727/42/7/073001
ISI WoS & article (hint: Kessels Helsinki 2016)
9325.5.2016
96
2010JanuaryReviewGeorge, S. M.Atomic Layer Deposition: An OverviewChem. Rev. 110 (2010) 111–13121226
http://dx.doi.org/10.1021/cr900056b
http://aldhistory.blogspot.fi11528.2.2016
97
20103 December, 2009ReviewArto Pakkala and Matti PutkonenAtomic Layer Deposition Handbook of Deposition Technologies for Films and Coatings, 3rd edition, Ed. P. Martin, William Andrew, Chapter 8, pages 364-39128111
https://www.elsevier.com/books/handbook-of-deposition-technologies-for-films-and-coatings/martin/978-0-8155-2031-3
ISBN-13: 978-0815520313 ISBN-10: 081552031Xhttp://aldhistory.blogspot.fi
98
201023 December 2009 onlnieReviewPuurunen, R. L., Kattelus, H. and Suntola, T.Handbook of silicon-based MEMS materials and technologies, Chapter Atomic layer deposition in MEMS technologyElsevier 2010, pp. 433–4461432
http://www.sciencedirect.com/science/book/9780815515944#ancp5
ISBN: 978-0-8155-1594-4http://aldhistory.blogspot.fi
99
2011NovemberReviewBae, C., Shin, H. and Nielsch, K.Surface modification and fabrication of 3d nanostructures by atomic layer depositionMRS Bull. 36 (2011) 887–8971191
http://dx.doi.org/10.1557/mrs.2011.264
http://aldhistory.blogspot.fi228.2.2016
100
201128 JulyReviewBakke, J. R., Pickrahn, K. L., Brennan, T. P. and Bent, S. F.Nanoengineering and interfacial engineering of photovoltaics by atomic layer depositionNanoscale 3 (2011) 3482–350827254
http://pubs.rsc.org/en/content/articlelanding/2011/nr/c1nr10349k/unauth#!divAbstract
http://aldhistory.blogspot.fi668.2.2016
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