A | B | C | D | E | F | G | H | I | J | K | L | M | N | O | P | Q | R | S | T | U | V | W | X | Y | Z | AA | AB | AC | AD | AE | AF | AG | ||
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1 | Note! This list contains work in progress. Duplicating this list and publishing this list elsewhere is *not permitted*. Linking to this list is ok. | |||||||||||||||||||||||||||||||||
2 | Link to share: | https://docs.google.com/spreadsheets/d/1RwwaxQHSGpr3ClquwincqBif1VgVdY9xLdXySJ1maVI/edit?usp=sharing | ||||||||||||||||||||||||||||||||
3 | List of ALD reviews (for the ALD History Review, #10 in the VPHA Publication Plan, and for other scientific purposes) | |||||||||||||||||||||||||||||||||
4 | * Info originally imported from the ALD History Blog http://aldhistory.blogspot.fi. To be updated with info from all sources. | |||||||||||||||||||||||||||||||||
5 | * To add review articles/books etc, please edit the info in the VPHA-reviews-to-be-added file, link: | |||||||||||||||||||||||||||||||||
6 | https://docs.google.com/spreadsheets/d/1AAA3UsHumhqlwKm-r_9SM5v0znrA5-VIVjxRtPR5810/edit#gid=828659824 | |||||||||||||||||||||||||||||||||
7 | * Collection of ALD review reading recommendations, especially aimed for newcomers in the field: | |||||||||||||||||||||||||||||||||
8 | https://docs.google.com/document/d/1Z7WymRGCyaIgk9vQIS_AAfyOWCwWS4ftqrtkfF_YyLI/edit?usp=sharing | |||||||||||||||||||||||||||||||||
9 | ||||||||||||||||||||||||||||||||||
10 | Year: (oldest first) | Date published | Type: Review / essay / inbook (= book chapter) / book / lecture notes / ... | Authors (for same year, make it alphabetical order, on the basis of first author's last name) | Title | Reference | # of pages | # of references | Internet link (preferred: DOI) | Other info (such as ISBN no.) | Source of data | Times cited (ISI WoS) | ISI WoS, date checked | Notes | CC license? (added 4.5.2020) | |||||||||||||||||||
11 | ||||||||||||||||||||||||||||||||||
12 | 1974 | Review | Aleskovskii, V. B. | Chemistry and technology of solids | Zh. Prikl. Khim. 47 (1974) 2145–2157. [J. Appl. Chem. USSR 47, 2207 (1974)]. | - | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
13 | 1975 | Review | Aleskovskii, V. B. | Chemical assembly of materials | Vestn. Akad. Nauk SSSR, 1975, 48-52. [In Russian] | 5 | ||||||||||||||||||||||||||||
14 | 1985 | August 1985 | Review | Suntola, T., Hyvärinen, J. | Atomic layer epitaxy | Annu. Rev. Mater. Sci. 15 (1985) 177–195 | 19 | 22 | http://www.annualreviews.org/doi/abs/10.1146/annurev.ms.15.080185.001141?journalCode=matsci.1 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||
15 | 1986 | Review | Goodman, C. H. L., Pessa, M. V | Atomic layer epitaxy | J. Appl. Phys. 60 (1986) R65–R81 | 17 | 67 | http://scitation.aip.org/content/aip/journal/jap/60/3/10.1063/1.337344 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
16 | 1988 | Review | Bedair, S. M., McDermott, B. T., Ide, Y., Karam, N. H., Hashemi, H., Tischler, M. A., Timmons, M., Tarn, J. C. L. and Elmasry, N. | Recent progress in atomic layer epitaxy of III–V compounds | J. Cryst. Growth 93 (1988) 182–189 | 8 | 24 | http://www.sciencedirect.com/science/article/pii/0022024888905258 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
17 | 1989 | November 1989 | Review | DenBaars, S. P., Dapkus, P. D. | Atomic layer epitaxy of compound semiconductors with metalorganic precursors | J. Cryst. Growth 98 (1989) 195–208 | 14 | 32 | http://www.sciencedirect.com/science/article/pii/0022024889901991 | http://aldhistory.blogspot.fi | 27 | 11.2.2016 | ||||||||||||||||||||||
18 | 1989 | April 1989 | Review | Suntola, T. | Atomic Layer Epitaxy | Mater. Sci. Reports 4 (1989) 261–312 | 52 | 164 | https://doi.org/10.1016/S0920-2307(89)80006-4 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||
19 | 1989 | Review | Suntola, T | Atomic layer epitaxy | Acta Polytech. Scand., Electr. Eng. Ser. 64 (1989) 242–270 | 29 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
20 | 1990 | Review | Aleskovskii, V. B., Drozd, V. E. | Principles of the precise synthesis of supermolecular objects: atomic layer epitaxy, molecular layering, chemical buildup | Acta Polytech. Scand., Chem. Technol. Ser. 195 (1990) 155–161 | 7 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
21 | 1990 | Review | Bedair, S. M. | Atomic layer epitaxy of semiconductor thin-films | Acta Polytech. Scand., Chem. Technol. Ser. 195 (1990) 17–37 | 21 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
22 | 1990 | Review | Leskelä, M. | Atomic layer epitaxy in the growth of polycrystalline and amorphous films | Acta Polytech. Scand., Chem. Technol. Ser. 195 (1990) 67–80 | 14 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
23 | 1990 | Review | Sitter. H., Faschinger. W. | Atomic-layer epitaxy of II–VI compound semiconductors | Adv. Solid State Phys. (Festk�orperprobleme) 30 (1990) 219–237. | 19 | 37 | http://link.springer.com/chapter/10.1007/BFb0108290 | Print ISBN 978-3-528-08038-9 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||
24 | 1990 | Review | Leskelä, M. and Niinistö, L. | Chemical aspects of the ALE process | Atomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 1–39 | 39 | http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612 | ISBN-13: 978-9401066617 ISBN-10: 9401066612 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
25 | 1990 | Review | Pakkanen, T. | Theoretical aspects of the ALE growth mechanisms | Atomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 40–62 | 23 | http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612 | ISBN-13: 978-9401066617 ISBN-10: 9401066612 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
26 | 1990 | Review | Mason, N. J. | Comparison of ALE with other techniques | Atomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 63–109 | 47 | http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612 | ISBN-13: 978-9401066617 ISBN-10: 9401066612 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
27 | 1990 | Review | Tischler, M. A., Bedair, S. M. | Atomic layer epitaxy of III– V compounds | Atomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 110–154. | 45 | http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612 | ISBN-13: 978-9401066617 ISBN-10: 9401066612 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
28 | 1990 | Review | Yao, T. | Atomic layer epitaxy of II–VI compounds | Atomic layer epitaxy, Eds. T. Suntola and M. Simpson, Blackie and Son, London 1990, pp. 155–180 | 26 | http://www.amazon.com/Atomic-Layer-Epitaxy-T-Suntola/dp/9401066612 | ISBN-13: 978-9401066617 ISBN-10: 9401066612 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
29 | 1990 | Review | Watanabe, H., Mizutani, T. and Usui, A. | Fundamentals of epitaxial growth and atomic layer epitaxy, In Very High Speed Integrated Circuits: Heterostructure | Ed. T. Ikoma, Vol. 30 of Semiconductors and Semimetals, Academic Press, San Diego 1990, pp. 1–52 | 52 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
30 | 1990 | Review in conference proceedings | J. Aarik | Atomic Layer Epitaxy | Proceedings on Electroluminescence XVIII. Tartu Ülikooli Toimetised 908 Preparation and investigation of thin solid films, Tartu, Estonia 1990, pp. 5-33. | 103 | http://dspace.ut.ee/handle/10062/32165 | (Riikka added) | ||||||||||||||||||||||||||
31 | 1991 | 11 February | Review | Brian W. Gregory, John L. Stickney | Electrochemical atomic layer epitaxy (ECALE) | J. Electroanal. Chem. 300 (1991) 543–561. | 19 | 112 | http://www.sciencedirect.com/science/article/pii/002207289185415L | http://aldhistory.blogspot.fi | 243 | 11.2.2016 | ||||||||||||||||||||||
32 | 1991 | Review | Marian A. Herman | Atomic layer epitaxy—12 years later | Vacuum 42 (1991) 61–66 | 6 | 59 | http://www.sciencedirect.com/science/article/pii/0042207X9190079X | http://aldhistory.blogspot.fi | 14 | 11.2.2016 | |||||||||||||||||||||||
33 | 1991 | August | Review | Usui, A., Watanabe, H. | Atomic layer epitaxy of III–V electronic materials | Annu. Rev. Mater. Sci. 21 (1991) 185–219 | 35 | 78 | http://www.annualreviews.org/doi/abs/10.1146/annurev.ms.21.080191.001153?journalCode=matsci.1 | http://aldhistory.blogspot.fi | 22 | 11.2.2016 | ||||||||||||||||||||||
34 | 1992 | April | Review | Ozeki, M. | Atomic layer epitaxy of III–V compounds using metalorganic and hydride sources | Mater. Sci. Rep. 8 (1992) 97–146 | 49 | 122 | http://www.sciencedirect.com/science/article/pii/092023079290008O | http://aldhistory.blogspot.fi | 35 | 11.2.2016 | ||||||||||||||||||||||
35 | 1992 | 28 July - 2 August | Review | Suntola, T. | Atomic layer epitaxy | Thin Solid Films 216 (1992) 84–89 | 6 | 15 | http://www.sciencedirect.com/science/article/pii/004060909290874B | http://aldhistory.blogspot.fi | 412 | 11.2.2016 | ||||||||||||||||||||||
36 | 1992 | October | Review | Usui, A. | Atomic layer epitaxy of III–V compounds: chemistry and applications | Proc. IEEE 80 (1992) 1641–1653 | 13 | 66 | http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=168671&url=http%3A%2F%2Fieeexplore.ieee.org%2Fxpls%2Fabs_all.jsp%3Farnumber%3D168671 | http://aldhistory.blogspot.fi | 24 | 11.2.2016 | ||||||||||||||||||||||
37 | 1993 | 25 March | Review | Niinistö, L. and Leskelä, M. | Atomic layer epitaxy: chemical opportunities and challenges | Thin Solid Films 225 (1993) 130– 135 | 6 | 41 | http://www.sciencedirect.com/science/article/pii/004060909390141B | http://aldhistory.blogspot.fi | 33 | 11.2.2016 | ||||||||||||||||||||||
38 | 1993 | 25 March | Review | Suntola, T. | Cost-effective processing by atomic layer epitaxy | Thin Solid Films 225 (1993) 96–98 | 3 | 4 | http://www.sciencedirect.com/science/article/pii/004060909390134B | http://aldhistory.blogspot.fi | 15 | 11.2.2016 | ||||||||||||||||||||||
39 | 1994 | September | Review | Bedair, S. M. | Atomic layer epitaxy deposition processes | J. Vac. Sci. Technol., B 12 (1994) 179–185. | 7 | 38 | http://dx.doi.org/10.1116/1.587179 | http://aldhistory.blogspot.fi | 12 | 11.2.2016 | ||||||||||||||||||||||
40 | 1994 | December | Review | Bedair, S. M. and El-Masry, N. A. | Recent advances in atomic layer epitaxy devices | Appl. Surf. Sci. 82/83 (1994) 7–13 | 7 | 19 | http://dx.doi.org/10.1016/0169-4332(94)90187-2 | http://aldhistory.blogspot.fi | 8 | 11.2.2016 | ||||||||||||||||||||||
41 | 1994 | 1 January | Review | Heitzinger, J. M., White, J. M., Ekerdt, J. G. | Mechanisms of GaAs atomic layer epitaxy - a review of progress | Surf. Sci. 299 (1994) 892–908 | 17 | 73 | http://dx.doi.org/10.1016/0039-6028(94)90705-6 | http://aldhistory.blogspot.fi | 18 | 11.2.2016 | ||||||||||||||||||||||
42 | 1994 | 2 January | Review | Lakomaa, E.-L. | Atomic layer epitaxy (ALE) on porous substrates | Appl. Surf. Sci. 75 (1994) 185–196. | 12 | 36 | http://dx.doi.org/10.1016/0169-4332(94)90158-9 | http://aldhistory.blogspot.fi | 88 | 11.2.2016 | ||||||||||||||||||||||
43 | 1994 | Review | Suntola, T. | Atomic layer epitaxy | Handbook of Crystal Growth, Ed. D. T. J. Hurle, Vol. 3, Elsevier, Amsterdam 1994, pp. 601–663 | 63 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
44 | 1995 | June | Review | Leskelä, M. and Ritala, M. | Atomic layer epitaxy in deposition of various oxide and nitride thin films | J. Phys. IV France 5 (1995) C5/937–C5/951 | 15 | 107 | https://hal.inria.fr/file/index/docid/253780/filename/ajp-jp4199505C5111.pdf | http://aldhistory.blogspot.fi | 53 | 11.2.2016 | Open acess? | |||||||||||||||||||||
45 | 1995 | 15 October | Review | Marian A. Herman | Approaches to understanding MBE growth phenomena | Thin Solid Films 267 (1995) 1–14 | 14 | 69 | http://dx.doi.org/10.1016/0040-6090(95)06592-X | http://aldhistory.blogspot.fi | 4 | 11.2.2016 | ||||||||||||||||||||||
46 | 1995 | Review | Suntola, T. | Atomic layer epitaxy | Handbook of Thin Film Process Technology, Eds. D. A. Glocker and S. I. Shah, Vol. 1, IOP Publishing, Bristol, United Kingdom 1995, pp. B1.5:1–B1.5:17. | 17 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
47 | 1996 | 1 August | Review | George, S. M., Ott, A. W. and Klaus, J. W. | Surface chemistry for atomic layer growth | J. Phys. Chem. 100 (1996) 13121–13131. | 11 | 69 | http://dx.doi.org/10.1021/jp9536763 | http://aldhistory.blogspot.fi | 503 | 12.2.2016 | ||||||||||||||||||||||
48 | 1996 | Review | Malygin, A. A. | Molecular layering technology and some of its applications | Zh. Prikl. Khim. 69 (1996) 1585–1593. [Russ. J. Appl. Chem. 69, 1419 (1996)] | 9 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
49 | 1996 | 15 January | Review | Malygin, A. A., Malkov, A. A. and Dubrovenskii, S. D. | The chemical basis of surface modification technology of silica and alumina by molecular layering method | Adsorption on new and modi ed inorganic sorbents, Eds. A. Dabrowski and V. A. Tertykh, Vol. 99 of Stud. Surf. Sci. Catal., Elsevier, Amsterdam 1996, pp. 213–236. | 24 | 82 | https://books.google.ru/books?id=n11C3L-YdfgC&printsec=copyright&hl=ru&source=gbs_pub_info_r#v=onepage&q&f=false | ISBN 0080526020, 9780080526027 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||
50 | 1996 | October | Review | Niinistö, L., Ritala, M. and Leskelä, M. | Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced applications | Mater. Sci. Eng., B 41 (1996) 23–29 | 7 | 61 | http://dx.doi.org/10.1016/S0921-5107(96)01617-0 | http://aldhistory.blogspot.fi | 139 | 12.2.2016 | ||||||||||||||||||||||
51 | 1996 | 2 July | Review | Suntola, T. | Surface chemistry of materials deposition at atomic layer level | Appl. Surf. Sci. 100/101 (1996) 391–398 | 8 | 44 | http://dx.doi.org/10.1016/0169-4332(96)00306-6 | http://aldhistory.blogspot.fi | 80 | 12.2.2016 | ||||||||||||||||||||||
52 | 1997 | September | Review | Haukka, S. and Suntola, T. | Advanced materials processing by adsorption control | Interface Sci. 75 (1997) 119–128 | 10 | 23 | http://dx.doi.org/10.1023/A:1008601024870 | http://aldhistory.blogspot.fi | 49 | 12.2.2016 | ||||||||||||||||||||||
53 | 1997 | March | Review | Marian A. Herman | Physical principles of ultrahigh vacuum atomic layer epitaxy | Appl. Surf. Sci. 112 (1997) 1–11 | 11 | 41 | http://dx.doi.org/10.1016/S0169-4332(96)00980-4 | http://aldhistory.blogspot.fi | 16 | 12.2.2016 | ||||||||||||||||||||||
54 | 1997 | March | Review | Mikko Ritala | Advanced ALE processes of amorphous and polycrystalline films | Appl. Surf. Sci. 112 (1997) 223–230. | 8 | 43 | http://dx.doi.org/10.1016/S0169-4332(96)01004-5 | http://aldhistory.blogspot.fi | 92 | 12.2.2016 | ||||||||||||||||||||||
55 | 1998 | 2 April online | Review | Malygin, A. A. | Modification of a filler’s surface by the molecular layering method | Compos. Interfaces 5 (1998) 561–569 | 9 | http://dx.doi.org/10.1163/156855498X00072 | http://aldhistory.blogspot.fi | 3 | 12.2.2016 | |||||||||||||||||||||||
56 | 1998 | April | Review | Niinistö, L. | Atomic layer epitaxy | Curr. Opin. Solid State Mater. Sci. 3 (1998) 147–152 | 6 | 62 | http://dx.doi.org/10.1016/S1359-0286(98)80080-6 | http://aldhistory.blogspot.fi | 66 | 12.2.2016 | ||||||||||||||||||||||
57 | 1999 | Review | Haukka, S., Lakomaa, E.-L. and Suntola, T. | Adsorption controlled preparation of heterogeneous catalysts | In Adsorption and its Applications in Industry and Environmental Protection, Ed. A. Dabrowski, Vol. 120A of Stud. Surf. Sci. Catal., Elsevier, Amsterdam 1999, pp. 715–750 | 36 | http://aldhistory.blogspot.fi | 58 | 12.2.2016 | |||||||||||||||||||||||||
58 | 1999 | September | Review | Leskelä, M. and Ritala, M. | ALD precursor chemistry: evolution and future challenges | J. Phys. IV France 9 (1999) Pr8/837–Pr8/852 | 16 | 112 | http://dx.doi.org/10.1051/jp4:19998106 | http://aldhistory.blogspot.fi | 24 | 12.2.2016 | ||||||||||||||||||||||
59 | 1999 | July | Review | Niinistö, L. | From precursors to thin films—thermoanalytical techniques in the thin film technology | J. Therm. Anal. Calorim. 56 (1999) 7–15 | 9 | 35 | http://dx.doi.org/10.1023/A:1010154818649 | http://aldhistory.blogspot.fi | 18 | 12.2.2016 | ||||||||||||||||||||||
60 | 1999 | March | Review | Ritala, M. and Leskelä, M. | Atomic layer epitaxy—a valuable tool for nanotechnology? | Nanotechnology 10 (1999) 19–24 | 6 | 47 | http://dx.doi.org/10.1088/0957-4484/10/1/005 | http://aldhistory.blogspot.fi | 208 | 12.2.2016 | ||||||||||||||||||||||
61 | 1999 | 18 June | Review | Stickney, J. L. | Electrochemical atomic layer epitaxy | Electroanal. Chem. 21 (1999) 75–209 | 135 | https://books.google.ru/books?id=UEDDFHXLaIUC&printsec=frontcover&hl=ru&source=gbs_ge_summary_r&cad=0#v=onepage&q&f=false | ISBN 0824746791, 9780824746797 | http://aldhistory.blogspot.fi | 73 | 12.2.2016 | ||||||||||||||||||||||
62 | 2001 | December | Review | Ikeda, K., Yanase, J., Sugahara, S. and Matsumura, M. | Atomic-layer- epitaxy of Si | J. Korean Phys. Soc. 39 (2001) S447–S458. | 12 | http://cat.inist.fr/?aModele=afficheN&cpsidt=13426559 | http://aldhistory.blogspot.fi | 1 | 12.2.2016 | |||||||||||||||||||||||
63 | 2002 | 22 April | Review | Leskelä, M. and Ritala, M. | Atomic layer deposition (ALD): from precursors to thin film structures | Thin Solid Films 409 (2002) 138–146 | 9 | 111 | http://dx.doi.org/10.1016/S0040-6090(02)00117-7 | http://aldhistory.blogspot.fi | 528 | 12.2.2016 | ||||||||||||||||||||||
64 | 2002 | Review | Malygin, A. A. | Synthesis of multicomponent oxide lowdimensional systems on the surface of porous silicon dioxide using the molecular layering method | Zh. Obshch. Khim. 72 (2002) 617–632. [Russ. J. Gen. Chem. 72, 575 (2002)]. | 16 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
65 | 2002 | Review | Ritala, M. and Leskelä, M. | Atomic layer deposition | In Handbook of Thin Film Materials, Ed. H. S. Nalwa, Vol. 1, Academic Press, San Diego 2002, pp. 103–159 | 57 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
66 | 2003 | February | Review | de Almeida, R. M. C. and Baumvol, I. J. R. | Reaction–diffusion in high-k dielectrics on Si | Surf. Sci. Rep. 49 (2003) 1–114 | 114 | 150 | http://dx.doi.org/10.1016/S0167-5729(02)00113-9 | http://aldhistory.blogspot.fi | 92 | 12.2.2016 | ||||||||||||||||||||||
67 | 2003 | 2 September | Review | John E. Crowell | Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies | Journal of Vacuum Science and Technology A, 21, 2003, S88 | 9 | 32 | http://dx.doi.org/10.1116/1.1600451 | http://aldhistory.blogspot.fi | 43 | 12.2.2016 | ||||||||||||||||||||||
68 | 2003 | 26 February | Review | Jones, A. C. and Chalker, P. R. | Some recent developments in the chemical vapour deposition of electrochemical oxides | J. Phys. D: Appl. Phys. 36 (2003) R80–R95 | 16 | http://iopscience.iop.org/article/10.1088/0022-3727/36/6/202/meta | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
69 | 2003 | Review | Hand, A. | Industry begins to embrace ALD | Semicon. Int. 26 (2003) 46–51 | 6 | http://cat.inist.fr/?aModele=afficheN&cpsidt=14767326 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||||
70 | 2003 | 3 November | Review | Kim, H. | Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing | J. Vac. Sci. Technol., B 21 (2003) 2231–2261 | 31 | 186 | http://dx.doi.org/10.1116/1.1622676 | http://aldhistory.blogspot.fi | 317 | 12.2.2016 | ||||||||||||||||||||||
71 | 2003 | 15 February - 1March | Review | Leskelä, M. and Ritala, M. | Rare-earth oxide thin films as gate oxides in MOSFET transistors | J. Solid State Chem. 171 (2003) 170–174 | 5 | 49 | http://dx.doi.org/10.1016/S0022-4596(02)00204-9 | http://aldhistory.blogspot.fi | 77 | 12.2.2016 | ||||||||||||||||||||||
72 | 2003 | 18 November | Review | Leskelä, M. and Ritala, M. | Atomic layer deposition chemistry: Recent developments and future challenges | Angew. Chem., Int. Ed. 42 (2003) 5548–5554 | 7 | 38 | http://dx.doi.org/10.1002/anie.200301652 | http://aldhistory.blogspot.fi | 446 | 12.2.2016 | ||||||||||||||||||||||
73 | 2003 | May | Review | Seidel, T., Londergan, A., Winkler, J., Liu, X. and Ramanathan, S. | Progress and opportunities in atomic layer deposition | Solid State Technol. 46 (2003) 67–71 | 5 | http://aldhistory.blogspot.fi | 12 | 12.2.2016 | ||||||||||||||||||||||||
74 | 2004 | Review | Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Kukli, K., Rahtu, A., Ritala, M. and Leskelä, M. | Some recent developments in the MOCVD and ALD of high- dielectric oxides | J. Mater. Chem. 14 (2004) 3101–3112 | 12 | 95 | http://dx.doi.org/10.1039/B405525J | http://aldhistory.blogspot.fi | 60 | 12.2.2016 | |||||||||||||||||||||||
75 | 2004 | 7 May | Review | Niinistö, L., Päiväsaari, J., Niinistö, J., Putkonen, M. and Nieminen, M. | Advanced electronic and optoelectronic materials by atomic layer deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials | Phys. Status Solidi A 201 (2004) 1443–1452 | 10 | 71 | http://dx.doi.org/10.1002/pssa.200406798 | http://aldhistory.blogspot.fi | 230 | 12.2.2016 | ||||||||||||||||||||||
76 | 2004 | Review | Ritala, M. | Atomic layer deposition | In High- Gate Dielectrics Ed. M. Houssa, IOP Publishing, London 2004, pp. 17–64 | 48 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||||
77 | 2005 | 14 July | Review | Putkonen, M., Sajavaara, T., Niinistö, L. and Keinonen, J. | Analysis of ALD-processed thin films by ion-beam techniques, | Anal. Bioanal. Chem. 382 (2005) 1791–1799 | 9 | 47 | http://dx.doi.org/10.1007/s00216-005-3365-3 | http://aldhistory.blogspot.fi | 45 | 12.2.2016 | ||||||||||||||||||||||
78 | 2005 | December | Review | Markku Leskelä, Kaupo Kukli, Mikko Ritala | Rare-earth oxide thin films for gate dielectrics in microelectronics | Journal of Alloys and Compounds 418 (2006) 27–34 | 8 | 111 | doi:10.1016/j.jallcom.2005.10.061 | |||||||||||||||||||||||||
79 | 2005 | 27 August | Review | Putkonen, M. and Niinistö, L. | Organometallic precursors for atomic layer deposition | Top. Organomet. Chem. 9 (2005) 125–145 | 21 | 164 | http://dx.doi.org/10.1007/b136145 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||
80 | 2005 | 18 February | Review | Puurunen, R. L. | Formation of metal oxide particles in atomic layer deposition during the chemisorption of metal chlorides: a review | Chemical Vapor Deposition 11 (2005) 79-90 | 12 | 77 | http://dx.doi.org/10.1002/cvde.200400021 | http://aldhistory.blogspot.fi | 45 | 12.2.2016 | ||||||||||||||||||||||
81 | 2005 | 30 June | Review | Puurunen, R. L. | Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process | J. Appl. Phys. 97 (2005) 121301 | 52 | 1207 | https://doi.org/10.1063/1.1940727 | http://www.vtt.fi/inf/julkaisut/muut/2010/Puurunen.pdf | http://aldhistory.blogspot.fi | 945 | 5.2.2016 | Open access | we need to add another column for primary internet link, and secondary open access copy link | |||||||||||||||||||
82 | 2006 | 19 January | Review | Elers, K. E., Blomberg, T., Peussa, M., Aitchison, B., Haukka, S. and Marcus, S. | Film uniformity in atomic layer deposition | Chem. Vap. Deposition 12 (2006) 13–24 | 12 | 29 | http://dx.doi.org/10.1002/cvde.200500024 | http://aldhistory.blogspot.fi | 46 | 12.2.2016 | ||||||||||||||||||||||
83 | 2006 | January | Review | Hyoungsun Kim and Paul C. McIntyre | Atomic Layer Deposition of Ultrathin Metal-Oxide Films for Nano-Scale Device Applications | Journal of the Korean Physical Society, 48, 2006, 5-17 | 13 | https://inis.iaea.org/search/search.aspx?orig_q=RN:42074611 | http://aldhistory.blogspot.fi | 40 | 12.2.2016 | |||||||||||||||||||||||
84 | 2006 | March | Review | Jones, A. C., Aspinall, H. C., Chalker, P. R., Potter, R. J., Manning, T. D., Loo, Y. F., O’Kane, R., Gaskell, J. M. and Smith, L. M. | Mocvd and ald of high-kappa dielectric oxides using alkoxide precursors | Chem. Vap. Deposition 12 (2006) 83–98 | 16 | 111 | http://dx.doi.org/10.1002/cvde.200500023 | http://aldhistory.blogspot.fi | 35 | 5.2.2016 | ||||||||||||||||||||||
85 | 2006 | Review article | A. A. Malygin | The molecular layering nanotechnology: Basis and application | J. Ind. Eng. Chem. Vol 12, No. 1, (2006) 1-11. | 11 | 45 | https://www.cheric.org/PDF/JIEC/IE12/IE12-1-0001.pdf | Riikka + article from Malygin | |||||||||||||||||||||||||
86 | 2006 | March | Review | Schumacher, M., Baumann, P. K. and Seidel, T. | AVD and ALD as two complementary technology solutions for next generation dielectric and conductive thin-film processing | Chem. Vap. Deposition 12 (2006) 99–108 | 10 | 32 | http://dx.doi.org/10.1002/cvde.200500027 | http://aldhistory.blogspot.fi | 40 | 5.2.2016 | ||||||||||||||||||||||
87 | 2007 | 2 October | Review | Knez, M., Nielsch, K. and Niinistö, L. | Synthesis and surface engineering of complex nanostructures by atomic layer deposition | Adv. Mater. 19 (2007) 3425–3438 | 14 | 113 | http://dx.doi.org/10.1002/adma.200700079 | http://aldhistory.blogspot.fi | 396 | 5.2.2016 | ||||||||||||||||||||||
88 | 2007 | July | Review | Markku Leskelä, Marianna Kemell, Kaupo Kukli, Viljami Pore, Eero Santala, Mikko Ritala, Jun Lu | Exploitation of atomic layer deposition for nanostructured materials | Mater. Sci. Eng. C 27 (2007) 1504–1508 | 5 | 39 | http://doi.org/10.1016/j.msec.2006.06.006 | |||||||||||||||||||||||||
89 | 2008 | Review | Sherman, A. | Atomic Layer Deposition for Nanotechnology: an enabling process for nanotechnology fabrication | Ivoryton Press, Connecticut 2008 | http://aldhistory.blogspot.fi | ||||||||||||||||||||||||||||
90 | 2008 | 17 June | Review | Zaera, F. | The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing | J. Mater. Chem. 18 (2008) 3521–3526 | 6 | 78 | http://dx.doi.org/10.1039/B803832E | http://aldhistory.blogspot.fi | 51 | 5.2.2016 | ||||||||||||||||||||||
91 | 2009 | 29 Sep. 2008 online | Review | Clavel, G., Rauwel, E., Willinger, M.-G. and Pinna, N. | Nonaqueous sol-gel routes applied to atomic layer deposition of oxides | J. Mater. Chem. 19 (2009) 454–462 | 9 | 83 | http://dx.doi.org/10.1039/B806215C | http://aldhistory.blogspot.fi | 26 | 5.2.2016 | ||||||||||||||||||||||
92 | 2009 | July | Review | Eobert M. Wallace, Paul C. McIntyre, Jiyoung Kim and Yoshio Nishi | Atomic Layer Deposition of Dielectrics on Ge and III-V Materials for Ultrahigh performance Transistors | MRS Bulletin, 34, 2009, 493-503 | 11 | 28 | http://dx.doi.org/10.1557/mrs2009.137 | http://aldhistory.blogspot.fi | 71 | 5.2.2016 | ||||||||||||||||||||||
93 | 2009 | February | Review | Kim, H., Lee, H.-B.-R. and Maeng, W. J. | Applications of atomic layer deposition to nanofabrication and emerging nanodevices | Thin Solid Films 517 (2009) 2563–2580 | 18 | 233 | http://dx.doi.org/10.1016/j.tsf.2008.09.007 | http://aldhistory.blogspot.fi | 230 | 8.2.2016 | ||||||||||||||||||||||
94 | 2009 | April | Review | Niinistö, J., Kukli, K., Heikkilä, M., Ritala, M. and Leskelä, M. | Atomic Layer Deposition of High-k Oxides of the Group 4 Metals for Memory Applications | Adv. Eng. Mat. 11 (2009) 223–234 | 12 | 86 | http://dx.doi.org/10.1002/adem.200800316 | http://aldhistory.blogspot.fi | 48 | 8.2.2016 | ||||||||||||||||||||||
95 | 2009 | Review | Ritala, M. and Niinistö, J. | Chemical vapour deposition, Chapter 4: Atomic layer deposition | Royal Society of Chemistry, Cambridge, UK 2009, pp. 158–206 | 49 | https://books.google.ru/books?hl=ru&lr=&id=42SnND7502UC&oi=fnd&pg=PA451&dq=Chemical+vapour+deposition+Royal+Society+of+Chemistry,+Cambridge,+UK+2009,+pp.+158%E2%80%93206&ots=LUsKWVLbXM&sig=8InfZtYrt4WO8OikEEnJ_aC-NBc&redir_esc=y#v=onepage&q&f=false | ISBN 0854044655, 9780854044658 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||||
96 | 2009 | Apr 7 | Topical review | Langereis, E., Heil, S. B. S., Knoops, H. C. M., Keuning, W., van de Sanden, M. C. M., Kessels, W. M. M. | In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition | J. Phys. D: 42 (2009) 073001 | 19 | 83 | http://dx.doi.org/10.1088/0022-3727/42/7/073001 | ISI WoS & article (hint: Kessels Helsinki 2016) | 93 | 25.5.2016 | ||||||||||||||||||||||
97 | 2010 | January | Review | George, S. M. | Atomic Layer Deposition: An Overview | Chem. Rev. 110 (2010) 111–131 | 21 | 226 | http://dx.doi.org/10.1021/cr900056b | http://aldhistory.blogspot.fi | 1152 | 8.2.2016 | ||||||||||||||||||||||
98 | 2010 | 3 December, 2009 | Review | Arto Pakkala and Matti Putkonen | Atomic Layer Deposition | Handbook of Deposition Technologies for Films and Coatings, 3rd edition, Ed. P. Martin, William Andrew, Chapter 8, pages 364-391 | 28 | 111 | https://www.elsevier.com/books/handbook-of-deposition-technologies-for-films-and-coatings/martin/978-0-8155-2031-3 | ISBN-13: 978-0815520313 ISBN-10: 081552031X | http://aldhistory.blogspot.fi | |||||||||||||||||||||||
99 | 2010 | 23 December 2009 onlnie | Review | Puurunen, R. L., Kattelus, H. and Suntola, T. | Handbook of silicon-based MEMS materials and technologies, Chapter Atomic layer deposition in MEMS technology | Elsevier 2010, pp. 433–446 | 14 | 32 | http://www.sciencedirect.com/science/book/9780815515944#ancp5 | ISBN: 978-0-8155-1594-4 | http://aldhistory.blogspot.fi | |||||||||||||||||||||||
100 | 2011 | November | Review | Bae, C., Shin, H. and Nielsch, K. | Surface modification and fabrication of 3d nanostructures by atomic layer deposition | MRS Bull. 36 (2011) 887–897 | 11 | 91 | http://dx.doi.org/10.1557/mrs.2011.264 | http://aldhistory.blogspot.fi | 22 | 8.2.2016 |