PECVD#1 300nm SiO2 film-2019

	B	C	D	E	F	G	H	I	J	K	L	M	N	O	P	Q	R	S	AC	AD
1		Film	Recipe	Subs.T	Thickness	Dep.time	JAW EC-400 (Woolam Spec. Ell.)		Dep.rate	Stress	BHF etch rate wafer	LPD (Gain4) particle size (0.16-1.6)um		Haze, for Gain4	LPD (Gain2) particle size (2.8-28.0)um		Photos	Photos	Comments/Brian Lingg PM	Notes
2																			Maintenance
3		SiO2	SiO2_10	250° C	(nm)	sec	Index @ 632.8nm	Index @ 1550nm	( nm/min)	(MPa)	( nm/min)	Before Deposition	After Deposition	%	Before Deposition	After Deposition	Surfscan	Optical microscope	Deposition done on 4"Si wafer

4							Index		Dep.rate	Stress							Dropbox/Biljana/Photos/2017/Particles/PECVD#1	Biljana/Gmail account	Replaced the Silane and Ammonia MFCs-Avg-2017
5	11-02-18	SiO2	SiO2_30	250	301.96	425.0	1.462	1.451	42.63	-479.03	556.20	0	60	74	2	29	good	to do	No showerhead pattern
6	01-22-19	SiO2	SiO2_30	250	313.51	425.0	1.462	1.452	44.26	-351.43	611.46	no data	no data	no data	no data	no data	no data	no data	No showerhead pattern
7	02-12-19	SiO2	SiO2_30	250	306.16	425.0	1.462	1.452	43.22	-331.49	610.66	no data	no data	no data	no data	no data	no data	no data	No showerhead pattern
8	03-15-19	SiO2	SiO2_30	250	316.84	425.0	1.460	1.449	44.73	-366.60	565.55	63	157	0	21	40	good	done, OK	No showerhead pattern
9	04-02-19	SiO2	SiO2_30	250	306.84	425.0	1.468	1.457	43.32	-428.81	612.52	17	276	100	6	51	good	done, OK	No showerhead pattern
10	05-03-19	SiO2	SiO2_30	250	306.95	425.0	1.461	1.449	43.33	-355.49	611.47	92	444	51	12	67	good	Some big particles (5-10)	No showerhead pattern
11	06-03-19	SiO2	SiO2_30	250	299.04	425.0	1.463	1.452	42.22	-334.77	594.09	25	101	85	0	45	good	several big particles (5-6)	No showerhead pattern
12	08-06-19	SiO2	SiO2_30	250	312.22	425.0	1.461	1.456	44.08	-380.38	592.34	48	207	no data	22	67	good	done, OK	No showerhead pattern
13	09-17-19	SiO2	SiO2_30	250	315.20	425.0	1.466	1.455	44.50	-434.61		no data	no data	no data	no data	no data	good	done, OK	No showerhead pattern
14	10-08-19	SiO2	SiO2_30	250	316.98	425.0	1.462	1.451	44.75	-354.09	585.98	106	549	57	12	164	good	done, OK	No showerhead pattern
15	11-04-19	SiO2	SiO2_30	250	316.51	425.0	1.467	1.457	44.68	-469.24	532.64	4	76	52	3	69	good	done, OK	No showerhead pattern
16	12-02-19	SiO2	SiO2_30	250	320.17	425.0	1.466	1.463	45.20	-464.87	561.85	95	211	35	24	63	good	some big, random particles	No showerhead pattern
17
18				Avg.Thickness	311.03	Avg Index	1.463	1.454
19						Index+1%	1.478	1.468
20						Index-1%	1.449	1.439
21								Avg Dep.Rate	43.91
22								Avg +10%	48.30
23								Avg - 10%	39.52
24									Avg. Stress	-395.90
25									Avg +30%	-514.67
26									Avg - 30%	-277.13
27										Avg. HF e.r.	584.98
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