List of ALD conferences for the ALD History Review (#10 in the VPHA Publication Plan)

* Info originally from the ALD History Blog http://aldhistory.blogspot.fi

* to be updated with info from all sources

* Some participant info from Parsons et al. review JVSTA 2013

* To add info: please write new conference info in the VPHA-conference-to-be-added file, linked in http://vph-ald.com/VPHAopenfiles.html, direct link below

https://docs.google.com/spreadsheets/d/1vWDElIVL5TTsu323bIm-T4zVqwUkLGjRwT5w8j4xv88/edit

Optional: Section

Country
(we will write country in an additional column, to allow country statistics)

# Presentations

Attendees from
# Countries

Note 1: conference info from

Note 2: participant info from

VTT Symposium 54

Markku Leskelä gave info on the chairs

Standard Telecommunication Laboratories, Harlow, England

Licenciate's thesis of Olli Jylhä (written here by Riikka)

Details from Markku Leskelä

ACSI-1 1ST INTERNATIONAL SYMPOSIUM ON ATOMICALLY CONTROLLED SURFACES AND INTERFACES: THE UNIVERSITY OF TOKYO, TOKYO, JAPAN, NOVEMBER 19–22, 1991

How much here was actually ALD? Note by Riikka

Second International Symposium on Atomically Controlled Surfaces and Interfaces

Riikka Puurunen, via Tuula Pakkanen. Markku Leskelä told that he edited the proceedings - to be checked if he was the only Editor.

North Carolina University (is this the correct way of writing?), USA

Tuula Pakkanen, written here by Riikka Puurunen

extrqa note: Whitten was the advisor of Prof Tapani Pakkanen's thesis

Helsinki, Finland, November 23-24, 1995

Programme and Abstracts Leskelä, Ritala, Kansikas (eds.), Yliopistopaino 1995

http://www.worldcat.org/title/programme-and-abstracts/oclc/58169072. Chair details from Markku Leskelä

Info comes from the book Catalysis in Finland - an exciting pathway, p. 99, chapter by Lakomaa (and co-workers), row 9. According to this info, Suntola would have presented there TMA reaction results on porous catalysts.

https://cds.cern.ch/record/325578/?ln=zh_TW

http://erb.nlib.ee/?kid=10541688

organization infro from Markku Leskelä
https://tuhat.halvi.helsinki.fi/portal/en/activities/esfalenet-symposium(2ebdd6e2-dde7-4207-aa6e-4140dd41575f).html

http://ald2016.com/wp-content/uploads/2016/02/ALD-Sponsorship-prospectus.pdf

Chair info from Markku Leskelä

http://www.helsinki.fi/ALD2004/

Dielectric and Semiconductor Materials, Devices, and Processing: G2 Atomic Layer Deposition Applications: Challenges and Opportunities

http://ma.ecsdl.org/content/MA2005-02/12

Dielectric and Semiconductor Materials, Devices, and Processing: E1 Atomic Layer Deposition Applications 2

http://ma.ecsdl.org/content/MA2006-02/21

Dielectric and Semiconductor Materials, Devices, and Processing: E1 Atomic Layer Deposition Applications 3

http://ma.ecsdl.org/content/MA2007-02/17

http://www.phys.tue.nl/ALD2008/

Dielectric and Semiconductor Materials, Devices, and Processing: E2 Atomic Layer Deposition Applications 4

http://ma.ecsdl.org/content/MA2008-02/24

Dielectric and Semiconductor Materials, Devices, and Processing: E2 Atomic Layer Deposition Applications 5

http://ma.ecsdl.org/content/MA2009-02/23

Dielectric and Semiconductor Materials, Devices, and Processing: E2 Atomic Layer Deposition Applications 6

http://ma.ecsdl.org/content/MA2010-02/20

http://www.picosun.com/sitenews/view/-/nid/31/ngid/6

http://www2.avs.org/conferences/ald/2011/index.html

Dielectric and Semiconductor Materials, Devices, and Processing: E2 Atomic Layer Deposition Applications 7

http://ma.ecsdl.org/content/MA2011-02/26

http://ald2012.namlab.com/

https://tu-dresden.de/die_tu_dresden/fakultaeten/fakultaet_elektrotechnik_und_informationstechnik/ihm/news/semicon2012

Dielectric and Semiconductor Materials, Devices, and Processing: E2 Atomic Layer Deposition Applications 8

Honolulu, Hawaii, USA, October 7-12, 2012

http://ma.ecsdl.org/content/MA2012-02/28

by PICOSUN report

http://www2.avs.org/conferences/ALD/2013/index.html

Dielectric and Semiconductor Materials, Devices and Processing: E2 Atomic Layer Deposition Applications 9

https://ecs.confex.com/ecs/224/webprogram/start.html

https://tu-dresden.de/die_tu_dresden/fakultaeten/fakultaet_elektrotechnik_und_informationstechnik/ihm/news/semicon2013

http://www.aldcoe.fi/bald2014/

http://www.ald2014.org/

Electronic Materials and Processing section: P1 Atomic Layer Deposition Applications 10

https://ecs.confex.com/ecs/226/webprogram/start.html

Grenoble, France, October 7, 2014 (at SEMICON Europa 2014)

http://www.c-ald.org/ald/index.html

http://www.c-ald.org/ald/CALD2014-Program.pdf

http://kemianseurat.fi/kemia/kp2015/

http://www.nanomanufacturing.nl/

http://www2.avs.org/conferences/ALD/2015/index.html

Ghent, Belgium, September 15-16, 2015

http://www.cocoon.ugent.be/workshop-batteries

http://ald-conf.ru/

http://www.bald2015.ee/

http://www.cost.eu/COST_Actions/mpns/MP1402

http://www.semiconeuropa.org/node/2171

Electronic Materials and Processing section: G01 Atomic Layer Deposition Applications 11

https://ecs.confex.com/ecs/228/webprogram/Symposium2632.html

http://aldhistory.blogspot.ru/

http://www.namlab.com/news/events-1/novel-high-k-application-workshop

Metal and ALD 1, Metal and ALD 2, Pannel: ALD for BEOL

http://www.mamconference.org/index.php

http://www2.imec.be/be_en//education/conferences/asd-workshop-2016.html

http://www.aldcoe.fi/herald/index.html

https://indico.cells.es/indico/event/63/

http://ald2016.com/

(many events missing from 2017)

http://eurocvd-balticald2017.se/

17th International Conference on Atomic Layer Deposition

Many sessions on ALD