PECVD1 SiO2 Data 2016

	B	C	D	E	F	G	H	I	J	K	L	M	N	O	P	Q	R	S	T	U	V	W	X	Y
1		User	Film	Recipe	Substrate T	Thickness	Dep.time	JAW EC-400 (Woolam Spec. Ell.)		Dep.rate	Stress	BHF etch rate wafer	LPD ( light point defects)		AVG dep.rate	AVG+10%	AVG-10%	Avg index	AVG+1%	AVG -1%	AVG.Stress	Avg+30%	Avg-30%	Comments/Brian Lingg PM
2																								Maintenance
3	1/1/2012	User	SiO2	SiO2_10	250° C	(Å)	sec	Index @ 632.8nm	Index @ 1550nm	( nm/min)	(MPa)	( nm/min)	before dep.	after dep.				Index @ 632.8nm						Deposition done on 4"Si wafer

4								Index		Dep.rate	Stress				Avg.dep.rate	Avg+10%	Avg-10%	Avg.Index	Avg+1%	Avg-1%	Avg.Stress	Avg+30%	Avg-30%
5	01-06-16	Biljana	SiO2	SiO2_10	250	1055.95	176.6	1.465	1.454	35.88	-680.02	549.48	61	426	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
6	02-05-16	Biljana	SiO2	SiO2_10	250	1156.47	176.6	1.458	1.447	39.29	-278.46	572.15	419	606	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
7	03-11-16	Biljana	SiO2	SiO2_10	250	1254.85	167.8	1.462	1.451	44.87	-364.62	523.35			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
8	03-18-16	Biljana	SiO2	SiO2_10	250	1278.18	167.8	1.462	1.452	45.70	-437.09	587.30			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
9	03-24-16	Biljana	SiO2	SiO2_10	250	1258.29	167.8	1.459	1.448	44.99	-357.36	575.85			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
10	04-11-16	Biljana	SiO2	SiO2_10	250	1159.16	167.8	1.457	1.447	41.45	-413.18	467.14	21	1125	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
11	04-26-16	Biljana	SiO2	SiO2_10	250	1103.77	167.8	1.458	1.447	39.47	-379.42	456.44			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
12	05-19-16	Biljana	SiO2	SiO2_10	250	1091.95	167.8	1.456	1.445	39.04	-376.71	453.76			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
13	06-24-16	Biljana	SiO2	SiO2_10	250	1114.66	167.8	1.476	1.462	39.86	-453.35	571.92			40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
14	08-26-16	Biljana	SiO2	SiO2_10	250	1111.81	167.8	1.456	1.446	39.75	-344.67	554.52	36	120	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11
15	11-18-16	Biljana	SiO2	SiO2_10	250	1218.80	167.8	1.462	1.451	43.58	-535.99	539.78	22	90	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11	Showerhead replaced sometime in November (after this deposition)
16	12-14-16	Biljana	SiO2	SiO2_10	250	963.42	167.8	1.461	1.450	34.45	-455.28	512.16	97	242	40.69	44.76	36.63	1.461	1.476	1.446	-423.01	-549.92	-296.11	Dep. rate dropped!. Film darker in the center. No showerhead pattern.
17					Avg.Thickness	1147.28	Avg Index	1.461	1.450
18							Index+1%	1.476	1.464
19							Index-1%	1.446	1.435
20									Avg Dep.Rate	40.69
21									Avg +10%	44.76
22									Avg - 10%	36.63
23										Avg. Stress	-423.01
24										Avg +30%	-549.92
25										Avg - 30%	-296.11
26											Avg. HF e.r.	530.32
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