Adv.PECVD 300nm STD Oxide-2021

	A	B	C	D	E	F	G	H	I	J	K	N	O	R	S	T	U	V	W	X	Y	Z	AA	AB	AC	AD
1	signup monkey ucsb	Film	Recipe	Subs. T	Coat.time	Dep.time	Thickness (Woollam)	Thickness (Wafer Mapping)	JAW EC-400 (Woolam S.E.)		Avg Index	Dep.rate	Avg.dep. rate	BHF e.r.	Stress	Avg Stress	Avg+30%	Avg-30%	LPD (gain4) paricle size (0.16-1.6)um		Haze, for Gain 4	LPD (gain2) particle size (1.6-28.0)um		Photos	Photos	Comment/Brian Ling maintenance
2				°C	min	min	(nm)	(nm)	Index @ 632.8nm	Index @ 1550nm	Index @ 632.8nm	(nm/min)	(nm/min)	(nm/min)	MPa				Before deposition	After deposition	%	Before deposition	After deposition	Surfscan	Opt.micr. DF	4"Si wafer placed in the center of platen

3			Oxide				wafer center	25 points (avg.)	Index		Avg.Index	Dep.rate	Avg.dep.rate		Stress	Avg.Stress	Avg+30%	Avg-30%								Maintenance
4	11/03/20	SiO2	STD oxide	300	10	10	300.15	294.89	1.475	1.464	1.476	30.02	28.94	350.86	-275.90	-268.67	-349.27	-188.07	139	519	45	34	47	Good	OK	good, small particles
5	01/04/21	SiO2	STD oxide	300	10	10	290.28	285.57	1.476	1.464	1.476	29.03	28.94	not done	-269.60	-268.67	-349.27	-188.07	47	210	52	26	75	Good	OK	Brian L: The CF4/O2 regulator on the gas panel was replaced (a day before tool had issue wtih CF4/O2 flow-could not run clean)
6	02/23/21	SiO2	STD oxide	300	10	10	280.30		1.476	1.466	1.476	28.03	28.94	not done	-274.66	-268.67	-349.27	-188.07	65	276	77	26	164	Good	OK	Brian L: it was done some PM between 1/4/21-2/23/21
7	04/19/21	SiO2	STD oxide	300	10	10	282.65		1.478	1.465	1.476	28.27	28.94	427.27	-276.63	-268.67	-349.27	-188.07	17	207	56	3	154	Good	OK	Nice, uniform film
8	05/19/21	SiO2	STD oxide	300	10	10	272.96		1.475	1.462	1.476	27.30	28.94	not done					38	151	90	4	85	good	OK	very good, uniform
9	06/15/21	SiO2	STD oxide	300	10	10	275.80	272.02	1.474	1.462	1.476	27.58	28.94	not done	-299.91	-268.67	-349.27	-188.07	46	493	62	26	90	good	OK	uniform film
10	07/19/21	SiO2	STD oxide	300	10	10	292.96	not done	1.475	1.464	1.476	29.30	28.94	not done	-272.78	-268.67	-349.27	-188.07	39	256	52	48	243	good	not done	NM 210719L4
11	07/21/21	SiO2	STD oxide	300	10	10	295.50	not done	1.475	1.464	1.476	29.55	28.94	not done	-267.18	-268.67	-349.27	-188.07	943	1038	52	89	114	good	not done	NM 210721L7
12	07/26/21	SiO2	STD oxide	300	10	10	289.29	not done	1.475	1.465	1.476	28.93	28.94	not done	-260.95	-268.67	-349.27	-188.07	76	112	52	29	53	good	not done	NM 210726L9
13	08/13/21	SiO2	STD oxide	300	10	10	300.75	not done	1.476	1.464	1.476	30.08	28.94	not done	-264.08	-268.67	-349.27	-188.07	92	622	23	89	117	good	not done	NM 210813C2
14	08/27/21	SiO2	STD oxide	300	10	10	293.48	not done	1.476	1.465	1.476	29.35	28.94	not done	-261.33	-268.67	-349.27	-188.07	314	2260	53	151	2254	good	not done	NM 210827D6
15	09/02/21	SiO2	STD oxide	300	10	10	294.67	not done	1.476	1.464	1.476	29.47	28.94	not done	-248.18	-268.67	-349.27	-188.07	110	186	52	52	76	good	not done	NM 210902E3
16	09/13/21	SiO2	STD oxide	300	10	10	289.10	not done	1.476	1.465	1.476	28.91	28.94	not done	-269.58	-268.67	-349.27	-188.07	141	229	52	62	100	good	not done	NM 210913F1
17	09/23/21	SiO2	STD oxide	300	10	10	288.78	not done	1.475	1.465	1.476	28.88	28.94	not done	-265.53	-268.67	-349.27	-188.07	80	302	52	29	50	good	not done	NM 210923G3
18	09/27/21	SiO2	STD oxide	300	10	10	289.12	not done	1.476	1.465	1.476	28.91	28.94	not done	-261.93	-268.67	-349.27	-188.07	24	231	52	15	44	good	not done	NM 210927G8
19	10/04/21	SiO2	STD oxide	300	10	10	294.42	not done	1.476	1.465	1.476	29.44	28.94	not done	-261.78	-268.67	-349.27	-188.07	26	59	52	13	76	good	not done	NM 211004H5
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25						Avg Thickness	285.27							389.07						Avg.Haze(%)	55
26							Avg Index		1.476	1.464		28.94		Avg Stress	-268.67								2
27							Index+1%		1.490	1.479		31.83		Avg+30%	-349.27
28							Index-1%		1.461	1.450		26.04		Avg-30%	-188.07
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