Thickness uniformity-Unaxis SiO2 LDR 250C- 2020

	B	C	D	E	F	G	H
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2		Thickness, A		Index @632.8nm		Thickn. Uniformity, %
3		Min	Max	Min	Max		Comment/Mike SIlva
4	Date	center of wafer	1cm from edge	center of wafer	1cm from edge	Thickness Uniformity, %
5	12-02-19	3030.00	2958.61	1.465	1.465	98.81	Thicker in the center
6	12-03-19	2994.88	2923.96	1.464	1.466	98.80	Thicker in the center
7	01-21-20	3019.08	2956.65	1.465	1.465	98.96	Thicker in the center
8	02-18-20	3052.08	2960.71	1.466	1.465	98.48	Thicker in the center
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18	Average:	3024.01	2949.98	1.465	1.465	98.76
19	Avg.+2%	3084.49	3008.98	1.494	1.495
20	Avg.-2%	2963.53	2890.98	1.436	1.436
21	Max	3052.08	2960.71	1.466	1.466	98.96
22	Min	2994.88	2923.96	1.464	1.465	98.48
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