PECVD1 SiO2 Data 2014

	A	B	C	D	E	F	G	H	I	J	K	L	M	N	O	P	Q	R	S	T	U	V	W	X
1		User	Film	Recipe	Substrate T	Thickness	Dep.time	JAW EC-400 (Woolam Spec. Ell.)		Dep.rate	Stress	BHF etch rate wafer	LPD ( light point defects)		AVG dep.rate	AVG+10%	AVG-10%	Avg index	AVG+1%	AVG -1%	AVG.Stress	Avg+30%	Avg-30%	Comments/Brian Lingg PM
2
3	1/1/2012	User	SiO2	SiO2_10	250° C	(Å)	sec	Index @ 632.8nm	Index @ 1550nm	( nm/min)	(MPa)	( nm/min)	before dep.	after dep.				Index @ 632.8nm						Deposition done on 4"Si wafer

4								Index		Dep.rate	Stress				Avg.dep.rate	Avg+10%	Avg-10%	Avg.Index	Avg+1%	Avg-1%	Avg.Stress	Avg+30%	Avg-30%
5	01-06-14	Biljana	SiO2	SiO2_10	250	1013.74	176.6	1.463	1.459	34.44	-401.73		284	1059	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Grouped particles
6	01-23-14	Biljana	SiO2	SiO2_10	250	1069.74	176.6	1.456	1.445	36.34	-375.92	604.28	159	290	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	1/23/2014
7	02-03-14	Biljana	SiO2	SiO2_10	250	1047.82	176.6	1.456	1.451	35.60	-346.54	604.71	304	451	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film is much darker in the center
8	02-18-14	Biljana	SiO2	SiO2_10	250	1031.00	176.6	1.454	1.444	35.03	-397.61	545.75	48	274	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	2/14/14 Silane change
9	03-14-14	Biljana	SiO2	SiO2_10	250	1053.21	176.6	1.455	1.444	35.78	-364.72	600.97	112	222	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
10	04-08-14	Biljana	SiO2	SiO2_10	250	1070.80	176.6	1.465	1.454	36.38	-460.47	578.93			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
11	04-17-14	Biljana	SiO2	SiO2_10	250	1035.09	176.6	1.464	1.453	35.17	-496.06	547.76	103	217	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
12	05-05-14	Biljana	SiO2	SiO2_10	250	1075.51	176.6	1.468	1.457	36.54	-462.66	531.80			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
13	05-20-14	Biljana	SiO2	SiO2_10	250	1066.69	176.6	1.454	1.444	36.24	-311.94	863.82			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
14	06-04-14	Biljana	SiO2	SiO2_10	250	1064.00	176.6	1.464	1.459	36.15		671.20			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Stress data weird?
15	06-16-14	Biljana	SiO2	SiO2_10	250	989.33	176.6	1.456	1.445	33.61	-438.88	903.22	15	62	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Wafer moved during deposition
16	08-01-14	Biljana	SiO2	SiO2_10	250	1027.16	176.6	1.464	1.453	34.90	-500.68	672.54			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	7/31/2014
17	08-14-14	Biljana	SiO2	SiO2_10	250	995.80	176.6	1.463	1.452	33.83	-457.62	692.45	36	192	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	Film darker in the center
18	08-29-14	Biljana	SiO2	SiO2_10	250	1004.45	176.6	1.456	1.446	34.13	-365.57	575.58	141	923	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	A lot of small particles in the center
19	09-16-14	Biljana	SiO2	SiO2_10	250	1007.15	176.6	1.462	1.457	34.22	-322.60	525.81			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	used old wafer, not clean enough( dots after HF etch)
20	10-01-14	Biljana	SiO2	SiO2_10	250	1043.66	176.6	1.470	1.459	35.46	-515.38	671.08	264	1092	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	A lot of particles! Why? PM?
21	10-15-14	Biljana	SiO2	SiO2_10	250	1036.30	176.6	1.460	1.449	35.21	-415.82	737.85			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	10/14/14 Silane change
22	11-06-14	Biljana	SiO2	SiO2_10	250	1094.46	176.6	1.460	1.449	37.18	-396.71	536.44	73	234	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87	10/23/2014
23	11-25-14	Biljana	SiO2	SiO2_10	250	1137.09	176.6	1.463	1.453	38.63	-314.80	545.14			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87
24	12-08-14	Biljana	SiO2	SiO2_10	250	1090.44	176.6	1.464	1.454	37.05	-389.84	589.49	129	436	35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87
25	12-23-14	Biljana	SiO2	SiO2_10	250	1137.40	176.6	1.464	1.459	38.64	-460.70	540.54			35.74	39.31	32.17	1.461	1.476	1.446	-409.81	-532.76	-286.87
26					Avg.Thickness	1051.94	Avg Index	1.461	1.452
27							Index+1%	1.476	1.466
28							Index-1%	1.446	1.437
29									Avg Dep.Rate	35.74
30									Avg +10%	39.31
31									Avg - 10%	32.17
32										Avg. Stress	-409.81
33										Avg +30%	-532.76
34										Avg - 30%	-286.87
35											Avg. HF e.r.	626.97
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