PECVD1 LS SiOxNy-3000A Thickness uniformity 2014

	B	C	D	E	F	G	H
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2		Thickness, (Å)		Index @632.8nm
3	Date	Max	Min	Max	Min	Thickness Uniformity, %	Comment
4		center of wafer	1cm from edge	center of wafer	1cm from edge
5	08-18-14	3119.72	3075.24	1.724	1.711	99.28	nice, uniform film
6	08-29-14	3203.07	3097.38	1.708	1.694	98.32
7	09-16-14	3248.06	3169.42	1.708	1.684	98.77
8	10-01-14	3320.32	3246.49	1.706	1.686	98.88
9	10-15-14	3238.07	3176.97	1.720	1.708	99.05
10	11-06-14	3337.15	3208.08	1.716	1.697	98.03
11	12-08-14	3065.41	2974.60	1.742	1.725	98.50	( silane,and O2 low)
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14	Average	3218.83	3135.45	1.718	1.701	98.69
15	Avg.+2%	3283.21	3198.16	1.752	1.735
16	Avg.-2%	3154.45	3072.75	1.683	1.667
17	Max	3337.15	3246.49	1.742	1.725	99.28
18	Min	3065.41	2974.60	1.706	1.684	98.03
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