Advanced PECVD Nitride2 Data 2014

	A	B	C	D	E	F	G	H	I	J	K	L	M	N	O	P	Q	R	S	T	U	V	W	X	Y
1	Date	User	Film	Recipe	Substrate T	Coat time	Dep.time	Thickness	JAW EC-400 (Woolam S. E.)		Avg. Index	Index+1%	Index-1%	Dep.rate	Avg. dep. Rate	Avg+10%	Avg-10%	HF e.r.	Stress	Avg Stress	Avg+30%	Avg-30%	LPD ( light point defects)		Comment/Mike Silva maintenance
2					300°C	min	sec	(Å)	Index @ 632.8nm	Index @ 1550nm				(nm/min)	(nm/min)	(nm/min)	(nm/min)	(nm/min)	(MPa)				before dep.	after dep.	4"Si wafer, placed in the center of platen

3				Nitride 2			Dep.time		Index		Avg.Index	Index+1%	Index-1%	Dep.rate	Avg.dep.rate	Avg+10%	Avg-10%		Stress	Avg Stress	Avg+30%	Avg-30%
4	01/17/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2686.61	1.951	1.916	1.961	1.981	1.942	8.96	7.93	8.72	7.14	50.14	489.51	494.09	642.31	345.86	107	385
5	01/30/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2718.44	1.953	1.920	1.961	1.981	1.942	9.06	7.93	8.72	7.14			494.09	642.31	345.86
6	02/03/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2737.37	1.954	1.916	1.961	1.981	1.942	9.12	7.93	8.72	7.14	46.21	462.40	494.09	642.31	345.86	107	2123	A lot of particles
7	02/18/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2725.59	1.951	1.918	1.961	1.981	1.942	9.09	7.93	8.72	7.14	44.79	472.74	494.09	642.31	345.86	64	367
8	03/12/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2700.46	1.951	1.913	1.961	1.981	1.942	9.00	7.93	8.72	7.14	52.13	498.07	494.09	642.31	345.86	66	239
9	04/03/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2682.07	1.951	1.912	1.961	1.981	1.942	8.94	7.93	8.72	7.14	45.72	498.33	494.09	642.31	345.86	392	559	Particles on the wafer from before
10	04/25/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2670.98	1.951	1.913	1.961	1.981	1.942	8.90	7.93	8.72	7.14	49.67	430.13	494.09	642.31	345.86			5/9/14 Mike rebuilt the top end of the process chamber
11	05/12/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2297.94	1.962	1.923	1.961	1.981	1.942	7.66	7.93	8.72	7.14	45.50	521.50	494.09	642.31	345.86			N2 low
12	05/13/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2258.98	1.957	1.919	1.961	1.981	1.942	7.53	7.93	8.72	7.14	50.14	496.42	494.09	642.31	345.86			N2 bottle changed
13	05/14/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2265.31	1.960	1.921	1.961	1.981	1.942	7.55	7.93	8.72	7.14	48.59	501.17	494.09	642.31	345.86
14	05/19/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2287.95	1.961	1.922	1.961	1.981	1.942	7.63	7.93	8.72	7.14	50.72	517.19	494.09	642.31	345.86			Silane change
15	05/20/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2254.58	1.959	1.921	1.961	1.981	1.942	7.52	7.93	8.72	7.14	46.39	513.30	494.09	642.31	345.86
16	05/20/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2278.75	1.961	1.922	1.961	1.981	1.942	7.60	7.93	8.72	7.14	49.99	492.72	494.09	642.31	345.86
17	05/21/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2259.67	1.951	1.919	1.961	1.981	1.942	7.53	7.93	8.72	7.14	54.92	577.58	494.09	642.31	345.86
18	06/04/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2325.17	1.963	1.925	1.961	1.981	1.942	7.75	7.93	8.72	7.14	47.90	461.84	494.09	642.31	345.86
19	06/17/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2293.19	1.966	1.927	1.961	1.981	1.942	7.64	7.93	8.72	7.14	62.16	509.48	494.09	642.31	345.86	11	144
20	07/29/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2216.00	1.965	1.926	1.961	1.981	1.942	7.39	7.93	8.72	7.14	40.22	539.43	494.09	642.31	345.86
21	08/14/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2277.84	1.957	1.918	1.961	1.981	1.942	7.59	7.93	8.72	7.14	43.70	476.55	494.09	642.31	345.86	48	1115	Mostly uniform, purple around edges! A lot of particles on one side of wafer!
22	08/28/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2097.81	1.965	1.926	1.961	1.981	1.942	6.99	7.93	8.72	7.14	38.90	493.90	494.09	642.31	345.86			Film OK, wafer- check cleaningless after HF etch
23	09/15/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2177.65	1.968	1.929	1.961	1.981	1.942	7.26	7.93	8.72	7.14	45.03	495.35	494.09	642.31	345.86
24	09/29/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2241.50	1.963	1.925	1.961	1.981	1.942	7.47	7.93	8.72	7.14	53.87	568.36	494.09	642.31	345.86	171	308
25	10/06/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2305.66	1.960	1.923	1.961	1.981	1.942	7.69	7.93	8.72	7.14	59.62	371.98	494.09	642.31	345.86			10/3/14 Mike replaced failed top electrode insulator
26	10/14/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2025.61	1.981	1.942	1.961	1.981	1.942	6.75	7.93	8.72	7.14	42.70	484.82	494.09	642.31	345.86			10/14/2014 Silane change, Chamber not clean!!!
27	11/07/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2318.77	1.975	1.937	1.961	1.981	1.942	7.73	7.93	8.72	7.14	42.05	497.79	494.09	642.31	345.86	87	174	Time for Std clean sometimes not long enough!
28	11/26/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2360.14	1.977	1.939	1.961	1.981	1.942	7.87	7.93	8.72	7.14	37.63	499.43	494.09	642.31	345.86
29	12/09/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2406.28	1.971	1.932	1.961	1.981	1.942	8.02	7.93	8.72	7.14	46.17	482.67	494.09	642.31	345.86	149	430
30	12/23/14	Biljana	Si3N4	Nitride 2	300	10min	1800.00	2364.61	1.967	1.928	1.961	1.981	1.942	7.88	7.93	8.72	7.14	46.18	493.60	494.09	642.31	345.86
31																	Avg.HFe.r.	47.79
32																		Avg Stress	494.09
33																		Avg+30%	642.31
34							Avg. Thickness	2379.07					Avg Dep.Rate	7.93				Avg-30%	345.86
35								Avg. Index	1.961	1.923			Avg +10%	8.72
36								Avg+1%	1.981	1.943			Avg - 10%	7.14
37								Avg-1%	1.942	1.904
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