Litho Survey Results
Survey Dates 10/3/19 through 10/14/19
149 Nanolab Members on Lithography Equipment (excluding staff)
Track users (not staff) is 103 and response rate is 60%
248 Total Nanolab Members on Survey Dates (excluding staff)
Deep UV Resists
Conventional UV Resists
Many members use multiple resists and responses were not limited to a single selection.
A resist stack refers to multiple coats on a single substrate, such as LOR + DUV, g-line + i-line, etc.
Histogram of Number of Resists/Resist Stacks Used
54% of responders use 1 - 2 resists/resist stacks
87% of responders use 1 - 4 resists/resist stacks
Resists/Resist Stacks Process Purpose