Workshop on use of fabrication facility at NRF
10 january, 2018
Venue: LT-2, Block-6
Timing: 2:30 pm to 5:30 pm
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Fabrication facility available at NRF
(Electron-Beam Lithography System, Maskless Lithography System , Mask Aligner, Wire Bonder, E-Beam Evaporation System, Thermal Evaporation System, Sputtering System, Wet Bench-1 (Solvent), Wet Bench-2 (Cleaning), Wet Bench-3 (Etching), Dual Wavelength UV Laser Lithography & Transmittance)
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