Raith Seminar Registration
Title: "State-of-the-art Electron-Beam Lithography with the Raith 100 keV EBPG Series Systems"

Date: Wednesday, October 18th, 2017
Time: 2:30–4:30 p.m.
Location: ETLC E1-008
Presenters: Mike Butler (Product Manager, Raith B.V.) and Andre Linden (Applications Scientist, Raith America)

Light refreshments will be provided prior to the seminar.

To register for this seminar, please fill out the following form.

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Are you a user of the nanoFAB's Raith150 Two EBL system? *
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